ALD 2017 Denver, Colorado July 15-18

ALD 2017: 

17th International Conference on Atomic Layer Deposition - Featuring the Atomic Layer Etching Workshop-

Web: http://www2.avs.org/conferences/ALD/2017/

DATE & LOCATION:  

July 15-18, 2017

Sheraton Denver, Denver, Colorado

Please note that this year’s Tutorial will be held on Saturday and Sessions and Exhibits will be held Sunday-Tuesday.  
Click here to learn more about the venue

SCOPE:

ALD 2017 will be a three-day meeting (preceded by a one day tutorial), dedicated to the science and technology of atomic layer controlled deposition of thin films. Once again the meeting will feature the Atomic Layer Etching Workshop. As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations will available online.

ABSTRACT DEADLINE: 

February 17, 2017 

WEBSITE:

Details will be posted to the ALD 2017 Website in November 2016.

Bookmark: www.ald-avs.org. 

PROGRAM CHAIRS:

• John Conley, Jr., Oregon State Univ., John.Conley@oregonstate.edu
• Charles Dezelah, SAFC Hitech | Sigma-Aldrich Corp, charles.dezelah@sial.com

QUESTIONS:

Contact Della Miller, AVS, 530-896-0477, della@avs.org