Dr. Knauts PHOTOS AVAILABLE NOW (LINK)
This year was a success and we grew slightly from last year to 80 participants in the tutorials, more than 90 delegates in total and 18 exhibiting sponsors. Out of the participants more than 70% came for the industry - hope to see more of you next year in April for EFDS ALD for Industry 2019!
Event page (LINK)
Day 1 - Lab tours, Tutorial and Social EventTour 1: Fraunhofer IKTS
The Thin Film Technology group at IKTS is engaged in research and development of CVD and ALD technologies for a broad range of applications. Several methods are used:
- thermal CVD processes at low pressure and atmospheric pressure (LPCVD, APCVD)
- plasma-enhanced CVD (PECVD)
- atomic layer deposition (ALD).
Layer materials like hard coatings, aligned carbon nanotubes (CNT), metal nitrides and dielectrics based on oxides of hafnium, zirconium and titanium and different perovskite materials is the main focus. The applications cover wear-resistant coatings & hard metals, actuating elements, sensors, lithium batteries and energy management and microelectronics.
Pictures form the lab tour as provided by EFDS.
Tour 2: IHM / NaMLab, TU Dresden
Update will follow
Tour 3: Fraunhofer IPMS (CNT)
Update will follow
- Welcome and Overview of Industria ALD, Jonas Sundqvist, Fraunhofer IKTS, Dresden, Germany
- Introduction to ALD, Johann Wolfgang Bartha, IHM, TU Dresden, Germany
- On Modelling Atomic Layer Etch processes: A Theoretical Perspective, Suresh Natarajan, Tyndall National Lab, Ireland
- What ALD can learn from CVD and what CVD can learn from ALD, Henrik Pedersen, Linköping University, Sweden
- ALD equipment and processes, Martin Knaut, TU Dresden, Germany
- ALD Precursor Development: From Laboratory to Industry, Paul Williams, Pegasus Chemicals, United Kingdom
- ALD chemistry on the computer, Andreas Zienert, Fraunhofer ENAS, Chemnitz, Germany
Great opening tutorial of #ALD4industry by @jv3sund giving an overview of industrial use of #ALDep pic.twitter.com/fd0vypstPK— Henrik Pedersen (@hacp81) March 21, 2018
Prof. Bartha from TU Dresden giving the fundamental introduction #ALDep #ALD4industry @coolsilicon @cfaed_TUD pic.twitter.com/XuF9lHwaon— BALD Engineering AB (@jv3sund) March 21, 2018
Prof. Pedersen from Sweden kicking serious #ALDep but at #ALD4industry #ALDep - Corrosion of Conformal thinking! @hacp81 pic.twitter.com/JtlH6uANZa— BALD Engineering AB (@jv3sund) March 21, 2018
Excellent tutorial on #ALEtch and how to model it by Dr Natarajan from @TyndallInstitut #ALD4industry pic.twitter.com/1T3BZbKyfV— Henrik Pedersen (@hacp81) March 21, 2018
Saxonian dinner at »Freiberger Schankhaus«Paul Wiliams from @PegasusChemical giving insights to collaborative #ALDep precursor development for High Volume Manufacturing #ALD4industry pic.twitter.com/7UbwOx4PfH— BALD Engineering AB (@jv3sund) March 21, 2018
Continental dinner in Saxony pic.twitter.com/YEPMoTb64u— Mikko Ritala (@MikkoRitala) March 21, 2018
Day 2 - Exhibition and WorkshopThe workshop had in total 18 sponsors from the ALD Industry that were also participating in the exhibition.
At the EFDS ALD For Industry this week we learned from several speakers that a huge amount of processes is migrating to #ALDep Atomic Layer Deposition in semiconductor manufacturing. Here B. Hintze @GFfab1 Presenting "ALD for industry - Enemy or friend" pic.twitter.com/byUmLNZgbg— BALD Engineering AB (@jv3sund) March 24, 2018
Besides many fantastic presentations, the big news at the ALD for Industry 2018 Conference in Dresden this week was the launch of the Veeco CNT Phoenix ALD Batch Cluster Tool #ALDep #ALD4Industry @Veeco https://t.co/D6TTJluWcT pic.twitter.com/OG3ioyR2z8— BALD Engineering AB (@jv3sund) March 23, 2018
Varun Sharma from ASM Microchemistry closing the EFDS ALD For Industry 2018 - see you all again in 2019 #ALDep #ALD4industry pic.twitter.com/9s5rYEBrzC— BALD Engineering AB (@jv3sund) March 22, 2018
ALOHA - The French #ALDep molecule magicians participating in #ALD4industry in Dresden! pic.twitter.com/uun9dsTgOc— BALD Engineering AB (@jv3sund) March 22, 2018