Thursday, January 4, 2018

Call for Abstracts - AVS 18th International Conference on Atomic Layer Deposition (ALD 2018)


The  AVS 18th International Conference on Atomic Layer Deposition (ALD 2018)  featuring the  5th International Atomic Layer Etching Workshop (ALE 2018)  will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. The conference will take place Sunday, July 29-Wednesday, August 1, 2018 , at the Songdo Convensia in Incheon, South Korea.

As in past conferences, the meeting will be preceded (Sunday, July 29) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, July 30-August 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 600+.

Key Deadlines:
Abstract Submission Deadline: February 16, 2018
Author Acceptance Notifications: April 9, 2018
Student Award Applications Deadline: May 1, 2018
Early Registration Deadline: June 1, 2018
Hotel Reservation Deadline: June 26, 2018
JVST Special Issue Deadline: September 5, 2018