Friday, March 24, 2017

Uniform ALD Al2O3 on graphene for future logic devices

TU Eindhoven and Philips Innovation Labs have just publishe a very intersteing paper on ALD of Al2O3 on prestine graphene inclusing various post deposition treatments to achive higher mobility. The trick to deposit uniform Al2O3 on graphene is by using reversible hydrogen plasma functionalization prior to ALD Al2O3 using a Oxford Instruments FlexAl PEALD reactor. Please check tha paper in Chemistrry of Materials below for more details.

Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization

René H. J. Vervuurt, Bora Karasulu, Marcel A. Verheijen, Wilhelmus (Erwin) M. M. Kessels, and Ageeth A. Bol

Chem. Mater., 2017, 29 (5), pp 2090–2100
DOI: 10.1021/acs.chemmater.6b04368

No comments:

Post a Comment