Sami Sneck from Beneq will presented about Rotary Spatial Plasma Enhanced Atomic Layer Deposition on Monday, 13 March, at the Shanghai International Expo Center.
- The benefits of rotary spatial PEALD
- µm-thick ALD films with high throughput
- optical coating stacks by rotary spatial PEALD.
Beneq R11 offers high-perfomance ALD in a low temperature plasma enhanced process for example for multilayer anti-reflection coatings. The deposition rates are really high (µm/hour for SiO2) as is the throughput (15000 pcs of 200 mm wafers/month).
The Beneq WCS 600 roll-to-roll ALD system has been designed for demanding flexible electronics applications. It is a high-capacity industrial ALD tool for up to 500 mm wide flexible substrates. It provides continuous coating capacity of 10 nm @ 1 m/min for materials such as AI2O3.
Beneq T2S is a batch wafer tool for high capacity ALD for semiconductor applications. It offers full cassette-to-cassette automation for up to 200 mm wafers with a capacity of 20 000 wafers/month (50 nm Al2O3 ). It is ideal for LED, MEMS, and sensor applications.
The Beneq WCS 600 roll-to-roll ALD system has been designed for demanding flexible electronics applications. It is a high-capacity industrial ALD tool for up to 500 mm wide flexible substrates. It provides continuous coating capacity of 10 nm @ 1 m/min for materials such as AI2O3.
Beneq T2S is a batch wafer tool for high capacity ALD for semiconductor applications. It offers full cassette-to-cassette automation for up to 200 mm wafers with a capacity of 20 000 wafers/month (50 nm Al2O3 ). It is ideal for LED, MEMS, and sensor applications.
[this story is a past event and will be updated when more information is available]
BALD Engineering talking to Beneq at ALD Ireland 2016 (Photo: Katharina Knaut)
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