Monday, March 6, 2017

Short course on Atomic Layer Deposition (ALD) – Eindhoven, April 20, 2017

Prof. Gregory Parsons (North Carolina State University) and Prof. Erwin Kessels (Eindhoven University of Technology) invite you to participate you in their Short course on Atomic Layer Deposition (ALD) which is aimed at people that are relatively new to the field of ALD. This includes students, technologists and other people that work – or are planning to work – on ALD but who have limited knowledge of the technology or of the underlying principles. 

The short course provides an introduction into ALD by providing the basics of ALD, giving an overview of the applications of ALD and describing why ALD has become so important in recent years. Insight into ALD reactors and related equipment is given and a comparison is made between ALD and other thin film techniques. Elementary aspects of precursors and precursor delivery are addressed and important information on film nucleation and other ideal and non-ideal growth effects is provided. Also, plasma and other energy-enhanced ALD methods will be described and selected cases of issues related to ALD as well as its merits will be presented.

For a full program, other information and registration,

This ALD short course takes place in the framework of NanoLabNL, which is a Dutch national facility for nanotechnology research.


Prof. Gregory Parsons (North Carolina State University, biography)
Prof. Erwin Kessels (Eindhoven University of Technology, biography)
Dr. Stephen Potts (University College London, biography)
Dr. Harm Knoops (Oxford Instruments /Eindhoven University of Technology, biography)

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