Monday, October 24, 2016

Final Agenda: ALD Symposium at SEMICON Europa, 25 October 2016

The 5th ALD Symposium at SEMICON Europa will be organized by ALD Lab Saxony, 25th of October in Grenoble France.

The intention of the symposium is to bring together researchers, process developers, tool makers, precursor suppliers and applicants of this exciting technology that can be summarized as Atomic Layer Processing.


Date: 25 October 2016
Time: 9:00–13:00
Location: Le Bans
Web : http://www.semiconeuropa.org/ald-lab
9:00

Welcome Address and Introduction of ALD Lab Saxony
Johann W. Bartha, TU Dresden, IHM
9:20

Growth of Ultrathin Cu Films Deposited by Atomic Layer Deposition for BEOL Application
Stefan E. Schulz, Fraunhofer ENAS
9:40

Development of Spatial ALD at the LMGP: Application to Transparent Conductive Materials
M. David Muñoz-Rojas, LMGP, Grenoble INP
10:00

How Fast Can We Go : Thermal ALD with Millisecond Purge Times
Jacques C. S. Kools, Encapsulix SAS
10:20

Atomic Layer Etching
Fred Roozeboom, TNO – Solliance, TU Eindhoven
10:40

Break
11:20

Visualization of Nucleation Mechanism During Atomic Layer Deposition with Scanning Probe Techniques
Marion Geidel, Johanna Reif, TU Dresden, IHM
11:40

Plasma ALD of Conductive Nitrides and Metals
Harm C. M. Knoops, Oxford Instruments
12:00

Novel liquid precursor sources for conformal Ln2O3 ALD and coatings
Nicolas Blasco, Air Liquide
12:20

ALD for Optical Applications
Tero Pilvi, Picosun Oy
12:40

Closing Address
Johann W. Bartha, TU Dresden, IHM