Friday, April 10, 2015

The 13th International Baltic ALD submission of abstracts and preregistration is now open

The 13th International Baltic Conference on Atomic Layer Deposition announce that the submission of abstracts and preregistration is now open at . The conference will be held in Tartu, Estonia at the Institute of Physics, University of Tartu, on September 28–29, 2015.

The conference organization is waiting for contributions, which would cover but would not be limited to following topics: 

       Design of ALD reactors
       Simulation and modeling of ALD
       Characterization of ALD
       Initiation of growth in ALD, ALD on graphene and related 2D materials
       Surface cleaning and etching in ALD
       ALD on powders and 3D substrates
       Atomic layer doping, ALD of solid solutions and nanolaminates
       Crystal growth in ALD, Atomic layer epitaxy
       Applications of ALD (high-k, optical materials, magnetic materials, hard coatings, anticorrosion coatings, surface functionalization, etc.) 

Templates of abstracts and other information related to details of abstract preparation and submission can be found at

The abstract submission deadline is April 29, 2015.

Registration will be open from April 17, 2015 at
The deadline for registration at discounted rates is July 15, 2015. The deadline for registration at regular rates is September 7, 2015.

We look forward to your active participation.

Sincerely yours,

Jaan Aarik
Kaupo Kukli
Conference Chairs
Institute of Physics, University Tartu

Further information
Mereli Kivi,
PCO Publicon,
Ph: +3727402838,

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