Spatial atmospheric ALD - a new laboratory and industrial tool for low-cost photovoltaics

A Mini Review on atmospheric Spatial ALD for PV applications. Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics:

Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics

David Muñoz-Rojas and Judith MacManus-Driscoll 

Mater. Horiz., 2014,1, 314-320 DOI: 10.1039/C3MH00136A

Abstract

Recently, a new approach to atomic layer deposition (ALD) has been developed that doesn't require vacuum and is much faster than conventional ALD. This is achieved by separating the precursors in space rather than in time. This approach is most commonly called Spatial ALD (SALD). In our lab we have been using/developing a novel atmospheric SALD system to fabricate active components for new generation solar cells, showing the potential of this novel technique for the fabrication of high quality materials that can be integrated into devices. In this minireview we will introduce the basics of SALD and illustrate its great potential by highlighting recent results in the field of photovoltaics.

 

 

Image from graphical abstract (Materials Horizons)