Tuesday, April 15, 2014

More Three-Dimensional Nanofabrication using Block Copolymer Self-Assembly by KAIST

In a recent blog post here reported about KAIST and others presented "ALD Assisted Pattern Multiplication of Block Copolymer for 5 nm Scale Nanopatterning". There seems to be no end to this topic here is a more full coverage in the form of a review paper "Three-Dimensional Nanofabrication using Block Copolymer Self-Assembly" [Free to download - thank you very much indeed!] work by KAIST.

“Three-Dimensional Nanofabrication by Block Copolymer Self-Assembly”

Caroline A. Ross*, Karl K. Berggren, Joy Y. Cheng, Yeon Sik Jung,* and Jae-Byum
Advanced Materials, 2014, published online

Thin films of block copolymers are widely seen as enablers for nanoscale fabrication of semiconductor devices, membranes, and other structures, taking advantage of microphase separation to produce well-organized nanostructures with periods of a few nm and above. However, the inherently threedimensional structure of block copolymer microdomains could enable them to make 3D devices and structures directly, which could lead to effi cient fabrication of complex heterogeneous structures. This article reviews recent progress in developing 3D nanofabrication processes based on block copolymers.

 
Check out this great page with access to most of the papers from The Functional Nanofabrication Lab at KAIST as free download - FUNNANO!