Saturday, February 13, 2016

A Combined Atomic-Layer-Deposition-in-MOF and Metal-Exchange Approach

Here is more ALD MOF work just published in Chemistry of Materials. Or rather AIM-ME = atomic layer deposition in metal–organic frameworks (MOFs) and metal exchange (ME) as a technique to install dispersed metal atoms into the mesoporous MOF. The ALD depositions were performed in a Savanah S100 system from Ultratech Cambridge Nanotech using a home build stainless steal powder reactor insert. Abstract is given blow.

Synthetic Access to Atomically Dispersed Metals in Metal–Organic Frameworks via a Combined Atomic-Layer-Deposition-in-MOF and Metal-Exchange Approach

Rachel C. Klet, Timothy C. Wang, Laura E. Fernandez, Donald G. Truhlar, Joseph T. Hupp, and Omar K. Farha
Chem. Mater., Article ASAP, DOI: 10.1021/acs.chemmater.5b04887

ALD-in-MOF Metal-Exchange (Figure above from graphical abstract)
 
The combination (AIM-ME) of atomic layer deposition in metal–organic frameworks (MOFs) and metal exchange (ME) is introduced as a technique to install dispersed metal atoms into the mesoporous MOF, NU-1000. Zn-AIM, which contains four Zn atoms per Zr6 node, has been synthesized through AIM and further characterized through density functional calculations to provide insight into the possible structure. Zn-AIM was then subjected to modification via transmetalation to yield uniform porous materials that present nonstructural Cu, Co, or Ni atoms.