HERALD COST action news: More volunteers invited to contribute to VPHA

VPHA ALD history blog: HERALD COST action news: More volunteers invited t...:

"Virtual Project on the History of ALD (VPHA), started in July 2013, is looking fore more voluntary participants, to help find answers to questions related to early days of ALD. Many will know that ALD has been invented twice under different names, Atomic Layer Epitaxy and Molecular Layering. Especially the works made under the name Molecular Layering have remained poorly known (and cited).

The core activity of VPHA is to list and read early ALD publications, and collect together personal summaries of ALD scientists of the contents of the individual publications. All VPHA activities are done in an atmosphere of openness, respect, and trust. A central information hub of VPHA is the dedicated webpage http://vph-ald.com, where one finds a link to the "ALD-history-evolving-file". An accompanying blog was recently created: http://aldhistory.blogspot.fi. Discussion related to VPHA is also carried out in the LinkedIn "ALD History" group. 

VPHA has already booked significant advances in understanding of the history of ALD, see the Publication Plan http://vph-ald.com/Publication%20Plan.html. However, the work is far from completed. As of 4.11.2015, a total of 347 ALD publications has been listed in VPHA for up to 1986, and 38 people from 11 countries and over 20 institutions have written 363 personal summaries of them. If each publication is to be read at least three times, about 30% of the reading & commenting work is still to be done. If we would have 100 volunteers each reading ten papers, completing the work should be easy.  

The next scientific joint publication from VPHA will be a poster at the ALD 2016 conference. All HERALD participants warmly welcome to join VPHA, to share the work in this unique and important effort and to enjoy its fruits.

Information on how to join and start contributing can be found in 

• VPHA Update and Invitation to participate http://vph-ald.com/Introduction%20and%20invitation%20to%20participate.html
• Organisational poster presented at Baltic ALD: http://vph-ald.com/VPHApublications/VPHA_BALD2015_poster_FINAL_2015-09-2...
• Organisational talk given at Russia ALD 2015: http://vph-ald.com/VPHApublications/VPHA-ALDrussia_talk_Puurunen-etal_FI...

Best regards,

Riikka Puurunen (Dr., Senior Scientist), VTT Technical Research Centre of Finland

Yury Koshtyal (Dr., Research Fellow), Ioffe Institute, St. Petersburg, Russia

Henrik Pedersen (Assoc. Prof.), Linköping University, Linköping, Sweden

J. Ruud Van Ommen (Assoc. Prof.), Delft University of Technology, Delft, the Netherlands;

Jonas Sundqvist (Dr., Senior Scientist), Technische Universität Dresden, Dresden, Germany; Lund University, Lund, Sweden

"

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Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust

EU COST Network HERALD is opening a new call for research visits (STSMs)

HERALD is opening a new call for research visits (STSMs) between now and the end of March 2016.  This is a rolling call - first come, first served.  Visits may last from 5-90 days and the usual level of funding is €2500.  Full information is available at http://www.european-ald.net/about-short-term-scientific-missions

Warm welcome to VaporPulse Technologies one of our new sponors!

A warm welcome to VaporPulse Technologies and Founder and Presiden Christopher Oldham - one of the new sponsors of the BALD Engeneering ALD News Blog! You will hear much more about VaporPulse and their ALD technology in the near future. Until then please do not hesitate to visit their web page : http://www.vaporpulse.com/

 

"VaporPulse we have commercialized a proprietary technology for improving materials used in everyday applications through our nanoscale coatings. The nanoscale coatings are delivered through a novel low temperature, solvent free process that offers extraordinary performance on well known but hard to process materials. VaporPulse’s coatings are highly functional and can be applied on a range of materials from paper to plastics to metals. Our coatings are conformal and uniform whether the part is flat or complex in shape, dense or porous, and the coatings can be applied on features down to the nano-scale."

"In 2010 VaporPulse Technologies, Inc. was launched out of NC State University. The VaporPulse technology is based on over ten years of research in the College of Engineering at NC State University and one year of business development in the Technology Entrepreneurship and Commercialization (TEC) program in the Poole College of Management at NC State University. "

ALD Special issue for Novel Nanomaterials and Emerging Applications

Here is a new ALD Special issue for Novel Nanomaterials and Emerging Applications http://www.hindawi.com/journals/jnm/si/289520/cfp/

Atomic Layer Deposition (ALD) has been recognized as a very powerful and elegant tool for nanostructured materials, greatly widening its applications into more and more research areas, ranging from semiconductors to catalysis, optoelectronics, biomedical, gas sensing, resistant coating, clean energies (batteries, fuel cells, supercapacitors, solar cells, etc.), and nano- and microelectromechanical systems (N/MEMS). These are mainly ascribed to the ALD’s unique growth mechanism based on sequentially surface-controlled saturation reactions, consequentially enabling atomic-scale layer-by-layer material growth. As a result, ALD is exclusively capable of constructing both large-scale uniform planar nanofilms and conformal complex nanocoatings at low temperature. ALD’s distinguished characteristics also include superior controllability over material composition and crystallinity.

All the merits make ALD an important technique in seeking new technical solutions and conducting fundamental frontier research. In searching for new energies, for example, ALD enables us to dramatically improve the batteries’ stability, safety, and sustainable high energy by applying subnanoprotective coatings on battery electrodes. ALD has also been reported for cost-effective catalysts, biocompatible devices, superblack light-absorbing materials, solar cell passivation layers, ultralight but ultrastiff mechanical metamaterials, and so on. These new advances witness ever-growing applications of ALD and foresee a new era of ALD. With the increasing importance of ALD as a new nanotechnology route, more research efforts are urgently needed, including new ALD processes based on novel precursors, advanced characterization, novel nanostructures, emerging applications in various areas, and innovations on ALD systems.

The purpose of this special issue is to provide a research forum to exchange the latest outcomes with ALD for nanostructured materials and exploring potentials of ALD-resultant nanomaterials for future applications. This special issue is soliciting original high-quality research work that has not been published or that is not currently under review by other journals or peer-reviewed conferences. The special issue will publish communications, full articles, and review papers.

Potential topics include, but are not limited to:

Novel nanostructured materials by ALD

• Nanofilms, nanoparticles, and nanotubes
• 3D nanostructures
• Nanocomposites

Emerging applications of ALD-induced nanomaterials

• Biomedical and biocompatible coatings
• Clean energies (batteries, fuel cells, solar cells, supercapacitors, etc.)
• Catalysis
• N/MEMS
• Optoelectronics
• Resistant coatings

Authors can submit their manuscripts via the Manuscript Tracking System at http://mts.hindawi.com/submit/journals/jnm/ald/.

Manuscript Due Friday, 29 April 2016

First Round of Reviews Friday, 22 July 2016

Publication Date Friday, 16 September 2016

Lead Guest Editor

Xiangbo Meng, Argonne National Laboratory, Illinois, USA

Guest Editors

Xinwei Wang, Peking University, Shenzhen, China

Dongsheng Geng, Western University, London, Canada

Cagla Ozgit-Akgun, ASELSAN Inc., Ankara, Turkey

Nathanaelle Schneider, IRDEP (EDF/CNRS/Chimie ParisTech), Chatou, France

High Throughput ALD Process at High Pressure Operations used to coat a VW Karman Ghia window

Here is a very, very, very interesting PhD thesis in ALD - woah! It is full of ground breaking and innovative ALD hardware solutions including a mobile ALD machine that you can dock to any flat surface anywhere and apply an ALD coating. Also includes ALD coatings on textile, synthetic fiber, and paper that may very well become future ALD business.

I promise you it is really worth spending time with this thesis - enjoy!

"High Throughput Atomic Layer Deposition Processes: High Pressure Operations, New Reactor Designs, and Novel Metal Processing"

Moatazbellah Mahmoud Mousa, North Carolina Stat University
http://repository.lib.ncsu.edu/ir/bitstream/1840.16/10637/1/etd.pdf

 

Docking an ALD machine to the back window of a Volkswagen Karman Ghia and performing a characteristic LAD linearity test.

The motivation

"The overall motive of this work is to demonstrate that controllable nanoscale thin film coatings can be achieved on macroscale objects, without the constraint of a reactor chamber in a well controlled laboratory environment. Therefore, as a proof of concept demonstration, we transported the system shown in Figure 5.1 [inserted below] outside the lab and attached the ALD delivery head to the window of an auto mobile in a parking area adjacent to our laboratory building. This same system was used to deposit the films shown and analyzed in Figure 5.2. Figure 5.4a [inserted above] shows a photograph of the system on a lab cart, where the delivery head is attached to the automobile window as shown in Figure 5.4b [inserted above]. In this demonstration, we chose to deposit a film on the window of an older Volkswagen because the window could be readily removed and carried to the lab for ellipsometry analysis [results below, linearity check]." 

 ALD delivery head and apparatus for the mobile ALD machine.

Resulting Al2O3 coating deposited in the car window and the Thickness vs. cycles plot showing a perfect linear relationship.

Open Source Review on Flash-Enhanced ALD from ALD Lab Dresden

Here is a fantastic Open Source review from ALD Lab Dresden (IHM, TU Dresden) on Flash Enhanced ALD coming from one of the probably coolest ALD tools today - The FHR.Star.100-ALD-PECVD-FLA (see below). Not all capabilities are reviled in this paper so you should stay tuned for more from Thomas Henke.

Flash-Enhanced Atomic Layer Deposition: Basics, Opportunities, Review, and Principal Studies on the Flash-Enhanced Growth of Thin Films

Thomas Henke, Martin Knaut, Christoph Hossbach, Marion Geidel, Lars Rebohle, Matthias Albert, Wolfgang Skorupa, Johann W. Bartha

doi: 10.1149/2.0301507jss ECS J. Solid State Sci. Technol. 2015 volume 4, issue 7, P277-P287 

 

Within this work, flash lamp annealing (FLA) is utilized to thermally enhance the film growth in atomic layer deposition (ALD). First, the basic principles of this flash-enhanced ALD (FEALD) are presented in detail, the technology is reviewed and classified. Thereafter, results of our studies on the FEALD of aluminum-based and ruthenium thin films are presented. These depositions were realized by periodically flashing on a substrate during the precursor exposure. In both cases, the film growth is induced by the flash heating and the processes exhibit typical ALD characteristics such as layer-by-layer growth and growth rates smaller than one Å/cycle. The obtained relations between process parameters and film growth parameters are discussed with the main focus on the impact of the FLA-caused temperature profile on the film growth. Similar, substrate-dependent growth rates are attributed to the different optical characteristics of the applied substrates. Regarding the ruthenium deposition, a single-source process was realized. It was also successfully applied to significantly enhance the nucleation behavior in order to overcome substrate-inhibited film growth. Besides, this work addresses technical challenges for the practical realization of this film deposition method and demonstrates the potential of this technology to extend the capabilities of thermal ALD.

Configuration of the FEALD process station comprising the flash lamp unit and the cross-flow deposition reactor. The small arrows illustrate the gas flow directions. 

 

The FHR.Star.100-ALD-PECVD-FLA - a comboned processing tool for ALD, PECVD and Rapid Thermal Annealing of 100 mm Wafers

ALD of Pd Nanoparticles on TiO2 Nanotubes for Ethanol Electrooxidation

Direct Ethanol Fuel Cells DEFCs are considered one of the promising renewable energy sources, as they can produce electrical energy directly from the ethanol electrooxidation reaction. The efficiency of ethanol electrooxidation is a big question from research point of view. Here French and Canadian researchers show how ALD Pd nano particles grown in anodic titanium oxide nanotubes can be used for Ethanol Electrooxidation.

Atomic Layer Deposition of Pd Nanoparticles on TiO2 Nanotubes for Ethanol Electrooxidation: Synthesis and Electrochemical Properties

Loïc Assaud, Nicolas Brazeau, Maïssa K. S. Barr, Margrit Hanbücken, Spyridon Ntais, Elena A. Baranova, and Lionel Santinacc

ACS Appl. Mater. Interfaces, Article ASAP
DOI: 10.1021/acsami.5b06056

 

 

Palladium nanoparticles are grown on TiO₂ nanotubes by atomic layer deposition (ALD), and the resulting three-dimensional nanostructured catalysts are studied for ethanol electrooxidation in alkaline media. The morphology, the crystal structure, and the chemical composition of the Pd particles are fully characterized using scanning and transmission electron microscopies, X-ray diffraction, and X-ray photoelectron spectroscopy. The characterization revealed that the deposition proceeds onto the entire surface of the TiO₂ nanotubes leading to the formation of well-defined and highly dispersed Pd nanoparticles. The electrooxidation of ethanol on Pd clusters deposited on TiO₂ nanotubes shows not only a direct correlation between the catalytic activity and the particle size but also a steep increase of the response due to the enhancement of the metal–support interaction when the crystal structure of the TiO₂ nanotubes is modified by annealing at 450 °C in air.

Zr of ZnO films deposited by Atomic Layer Deposition

Here is an interesting open access paper by researchers at University of Liverpool for all of us zirconium lovers from a special issue Atomic Layer Deposition of Functional Materials, http://www.mdpi.com/journal/materials/special_issues/atomic-layer-deposition edited by Peter J. King. It is  fantastic to see how even low amounts of Zr can improve sort of any material including even ZnO.

The effects of Zr doping on the optical, electrical and microstructural properties of thin ZnO films deposited by Atomic Layer Deposition

Stephania Herodotou, Robert E. Treharne , Ken Durose , Gordon J. Tatlock , Richard J. Potter 

Received: 16 September 2015

This paper has been published in Materials at the following website: http://www.mdpi.com/1996-1944/8/10/5369

Zr doping dependence of resistivity, carrier concentration and mobility for ZnO films ~85 nm thick.

Transparent conducting oxides (TCOs), with high optical transparency (≥85%) and low electrical resistivity (10−4 Ω·cm) are used in a wide variety of commercial devices. There is growing interest in replacing conventional TCOs such as indium tin oxide with lower cost, earth abundant materials. In the current study, we dope Zr into thin ZnO films grown by atomic layer deposition (ALD) to target properties of an efficient TCO. The effects of doping (0–10 at.% Zr) were investigated for ~100 nm thick films and the effect of thickness on the properties was investigated for 50–250 nm thick films. The addition of Zr4+ ions acting as electron donors showed reduced resistivity (1.44 × 10−3 Ω·cm), increased carrier density (3.81 × 1020 cm−3), and increased optical gap (3.5 eV) with 4.8 at.% doping. The increase of film thickness to 250 nm reduced the electron carrier/photon scattering leading to a further reduction of resistivity to 7.5 × 10−4 Ω·cm and an average optical transparency in the visible/near infrared (IR) range up to 91%. The improved n-type properties of ZnO: Zr films are promising for TCO applications after reaching the targets for high carrier density (>1020 cm−3), low resistivity in the order of 10−4 Ω·cm and high optical transparency (≥85%).

VPHA ALD history blog: VPHA ALD blog goes public

VPHA ALD history blog: VPHA ALD blog goes public: Three days after its initiation, the VPHA ALD blog at  http://aldhistory.blogspot.fi is sufficiently ready to be released for search engine...

Imec FinFET to Vertical Nanowire FET Movie

Here is a cool video from Imec showing the transition from FinFET via horizontal Nanowires to ultimately vertical Nanowire channel transistors. The movie and the whole article is available in the Imec monthly magazine on page 6 (http://magazine.imec.be/data/69/reader/reader.html?t=1445986965356#!preferred/1/package/69/pub/75/page/6)

 

Screendump showing the ultimate goal of integration III/V vertical nanowire transistors.

"Driven by the growing demand for increased communication and increased mobile and server data traffic, CMOS technologies will require continuous innovations in the field of ultra-low power operation, performance and density scaling. And this at an affordable cost. In this movie, we visualize the evolution of a FinFET architecture into the next technology generations: from tall Si fins and source/drain stressors over "

Nanocrystalline Ferroelectric BiFeO3 Thin Films by Low-Temperature ALD

Here is a new interesting paper on ferroelectric BFO deposited in an Ultratech Cambridge Nanotech Savannah reactor Institut de Ciencia de Materials de Barcelona (ICMAB-CSIC). The thermal ALD process at 250 °C by alternate pulsing of bismuth tris(2,2,6,6-tetramethyl-3,5-heptanedionate) (Bi(thd)₃) and ferrocene (Fe(Cp)₂) combined with ozone (O₃)

Nanocrystalline Ferroelectric BiFeO3 Thin Films by Low-Temperature ALD

Mariona Coll*, Jaume Gazquez, Ignasi Fina, Zakariya Khayat, Andy Quindeau, Marin Alexe, Maria Varela, Susan Trolier-McKinstry, Xavier Obradors, and Teresa Puig;

Chem. Mater., 2015, 27 (18), pp 6322–6328

DOI: 10.1021/acs.chemmater.5b02093

In this work, ferroelectricity is identified in nanocrystalline BiFeO3 (BFO) thin films prepared by low-temperature atomic layer deposition. A combination of X-ray diffraction, reflection high energy electron diffraction, and scanning transmission electron microscopy analysis indicates that the as-deposited films (250 °C) consist of BFO nanocrystals embedded in an amorphous matrix. Postannealing at 650 °C for 60 min converts the sample to a crystalline film on a SrTiO3substrate. Piezoelectric force microscopy demonstrates the existence of ferroelectricity in both as-deposited and postannealed films. The ferroelectric behavior in the as-deposited stage is attributed to the presence of nanocrystals. Finally, a band gap of 2.7 eV was measured by spectroscopic ellipsometry. This study opens broad possibilities toward ferroelectric oxides on 3D substrates and also for the development of new ferroelectric perovskites prepared at low temperature.

 

Atomic Layer Deposition (ALD) in Energy, Environment, and Sustainability

Atomic Layer Deposition (ALD) in Energy, Environment, and Sustainability

Figure. Schematic diagram of an ideal surface coating layer on active materials. Image provided by Xueliang Sun.

Guest Editors

Hongjin Fan, Nanyang Technological University, Singapore
Yongfeng Mei, Fudan University, China
Mato Knez, CIC nanoGUNE Research Center, Spain

Scope

The essential characteristics of an atomic layer deposition (ALD) reaction are the sequential self-limiting surface reactions to achieve conformal thin films with sub-monolayer thickness control. This advantage over other deposition processes renders a wide range of applications. While ALD was conventionally applied mainly in semiconductor electronic industry, recently, it is receiving increasing attention for wider applications in energy, environment, and sustainability research, with the advance in recipe development.

This focus collection will centre on the increasing importance of ALD techniques in developing innovative nanoscale materials, processes, devices, and systems relating to energy and environmental applications. Original and Review work detailing the development of energy nanomaterials and devices, including photovoltaics, batteries and supercapacitors, fuel cells, photocatalysts, and photoelectrochemical cells are solicited. Additionally developments in nanophotonics, including applications of ALD in new plasmonics, nanoscale laser, and metamaterials research are included. Interest of this collection also extends to innovations in chemical and biosensing using ALD, for example, organic pollution degradation, surface plasmon sensors, and quantum dot biomarkers.

The scope of this collection includes:

• Fabrication and synthesis
• Energy storage and conversion
• Micro and nano-photonics
• Sensor for environment and healthcare
• Devices integration and reliability

We hope this issue provides a broad overview of the current state and guidance to the future.

Invited reviews

Applications of atomic layer deposition in solar cellsOPEN ACCESSWenbin Niu, Xianglin Li, Siva Krishna Karuturi, Derrick Wenhui Fam, Hongjin Fan, Santosh Shrestha, Lydia Helena Wong and Alfred Iing Yoong Tok2015 Nanotechnology 26 064001

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Elegant design of electrode and electrode/electrolyte interface in lithium-ion batteries by atomic layer depositionJian Liu and Xueliang Sun2015 Nanotechnology 26 024001

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Viewpoints

Towards high-energy and durable lithium-ion batteries via atomic layer deposition: elegantly atomic-scale material design and surface modificationXiangbo Meng2015 Nanotechnology 26 020501

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Papers

The effect of ALD-grown Al2O3 on the refractive index sensitivity of CVD gold-coated optical fiber sensorsDavid J Mandia, Wenjun Zhou, Matthew J Ward, Howie Joress, Jeffrey J Sims, Javier B Giorgi, Jacques Albert and Seán T Barry2015 Nanotechnology 26 434002

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Extremely high efficient nanoreactor with Au@ZnO catalyst for photocatalysisChung-Yi Su, Tung-Han Yang, Vitaly Gurylev, Sheng-Hsin Huang, Jenn-Ming Wu and Tsong-Pyng Perng2015 Nanotechnology 26 394001

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Highly photocatalytic TiO2 interconnected porous powder fabricated by sponge-templated atomic layer depositionShengqiang Pan, Yuting Zhao, Gaoshan Huang, Jiao Wang, Stefan Baunack, Thomas Gemming, Menglin Li, Lirong Zheng, Oliver G Schmidt and Yongfeng Mei2015 Nanotechnology 26 364001

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Control of the initial growth in atomic layer deposition of Pt films by surface pretreatmentJung Joon Pyeon, Cheol Jin Cho, Seung-Hyub Baek, Chong-Yun Kang, Jin-Sang Kim, Doo Seok Jeong and Seong Keun Kim2015 Nanotechnology 26 304003

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Three-dimensional SnO2@TiO2 double-shell nanotubes on carbon cloth as a flexible anode for lithium-ion batteriesHaifeng Zhang, Weina Ren and Chuanwei Cheng2015 Nanotechnology 26 274002

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Deposition of uniform Pt nanoparticles with controllable size on TiO2-based nanowires by atomic layer deposition and their photocatalytic propertiesChih-Chieh Wang, Yang-Chih Hsueh, Chung-Yi Su, Chi-Chung Kei and Tsong-Pyng Perng2015 Nanotechnology 26 254002

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In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structuresT W Pi, Y H Lin, Y T Fanchiang, T H Chiang, C H Wei, Y C Lin, G K Wertheim, J Kwo and M Hong2015 Nanotechnology 26 164001

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Pd nanoparticles on ZnO-passivated porous carbon by atomic layer deposition: an effective electrochemical catalyst for Li-O2 batteryXiangyi Luo, Mar Piernavieja-Hermida, Jun Lu, Tianpin Wu, Jianguo Wen, Yang Ren, Dean Miller, Zhigang Zak Fang, Yu Lei and Khalil Amine2015 Nanotechnology 26 164003

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Inert ambient annealing effect on MANOS capacitor memory characteristicsNikolaos Nikolaou, Panagiotis Dimitrakis, Pascal Normand, Dimitrios Skarlatos, Konstantinos Giannakopoulos, Konstantina Mergia, Vassilios Ioannou-Sougleridis, Kaupo Kukli, Jaakko Niinistö, Kenichiro Mizohata, Mikko Ritala and Markku Leskelä2015 Nanotechnology 26 134004

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Impact of the atomic layer deposition precursors diffusion on solid-state carbon nanotube based supercapacitors performancesGiuseppe Fiorentino, Sten Vollebregt, F D Tichelaar, Ryoichi Ishihara and Pasqualina M Sarro2015 Nanotechnology 26 064002

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Deposition of ultra thin CuInS2 absorber layers by ALD for thin film solar cells at low temperature (down to 150 °C)Nathanaelle Schneider, Muriel Bouttemy, Pascal Genevée, Daniel Lincot and Frédérique Donsanti2015 Nanotechnology 26 054001

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Photocatalytic activity and photocorrosion of atomic layer deposited ZnO ultrathin films for the degradation of methylene blueYan-Qiang Cao, Jun Chen, Hang Zhou, Lin Zhu, Xin Li, Zheng-Yi Cao, Di Wu and Ai-Dong Li2015 Nanotechnology 26 024002

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Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxideStephan Ratzsch, Ernst-Bernhard Kley, Andreas Tünnermann and Adriana Szeghalmi2015 Nanotechnology 26 024003

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Gas sensing properties and p-type response of ALD TiO2 coated carbon nanotubesCatherine Marichy, Nicola Donato, Mariangela Latino, Marc Georg Willinger, Jean-Philippe Tessonnier, Giovanni Neri and Nicola Pinna2015 Nanotechnology 26 024004

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Air-Stable flexible organic light-emitting diodes enabled by atomic layer depositionYuan-Yu Lin, Yi-Neng Chang, Ming-Hung Tseng, Ching-Chiun Wang and Feng-Yu Tsai2015 Nanotechnology 26 024005

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Atomic-layer-deposition alumina induced carbon on porous NixCo1 − xO nanonets for enhanced pseudocapacitive and Li-ion storage performanceCao Guan, Yadong Wang, Margit Zacharias, John Wang and Hong Jin Fan2015 Nanotechnology 26 014001

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Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer depositionHuan-Yu Shih, Ming-Chih Lin, Liang-Yih Chen and Miin-Jang Chen2015 Nanotechnology 26 014002

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NiO/nanoporous graphene composites with excellent supercapacitive performance produced by atomic layer depositionCaiying Chen, Chaoqiu Chen, Peipei Huang, Feifei Duan, Shichao Zhao, Ping Li, Jinchuan Fan, Weiguo Song and Yong Qin2014 Nanotechnology 25 504001

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Electrochemical synthesis of highly ordered nanowires with a rectangular cross section using an in-plane nanochannel arrayPhilip Sergelius, Josep M Montero Moreno, Wehid Rahimi, Martin Waleczek, Robert Zierold, Detlef Görlitz and Kornelius Nielsch2014 Nanotechnology 25 504002

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Highly ordered and vertically oriented TiO2/Al2O3 nanotube electrodes for application in dye-sensitized solar cellsJae-Yup Kim, Kyeong-Hwan Lee, Junyoung Shin, Sun Ha Park, Jin Soo Kang, Kyu Seok Han, Myung Mo Sung, Nicola Pinna and Yung-Eun Sung2014 Nanotechnology 25 504003

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Distinguishing plasmonic absorption modes by virtue of inversed architectures with tunable atomic-layer-deposited spacer layerYun Zhang, Kenan Zhang, Tianning Zhang, Yan Sun, Xin Chen and Ning Dai2014 Nanotechnology 25 504004

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Cellulose nanofiber-templated three-dimension TiO2 hierarchical nanowire network for photoelectrochemical photoanodeZhaodong Li, Chunhua Yao, Fei Wang, Zhiyong Cai and Xudong Wang2014 Nanotechnology 25 504005

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Spatial resolution in thin film deposition on silicon surfaces by combining silylation and UV/ozonolysisLei Guo and Francisco Zaera2014 Nanotechnology 25 504006

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Atomic layer deposition of lithium phosphates as solid-state electrolytes for all-solid-state microbatteriesBiqiong Wang, Jian Liu, Qian Sun, Ruying Li, Tsun-Kong Sham and Xueliang Sun2014 Nanotechnology 25 504007

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Nanostructured TiO2/carbon nanosheet hybrid electrode for high-rate thin-film lithium-ion batteriesS Moitzheim, C S Nimisha, Shaoren Deng, Daire J Cott, C Detavernier and P M Vereecken2014 Nanotechnology 25 504008

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