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Tuesday, November 6, 2018

Review Article - ALD for oxide semiconductor thin film transistors

Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development

Jiazhen Sheng, Jung-Hoon Lee, Wan-Ho Choi, TaeHyun Hong, MinJung Kim, and Jin-Seong Park
Journal of Vacuum Science & Technology A 36, 060801 (2018)

 
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