Tuesday, July 22, 2014

Riber signs distribution agreement with CVD & ALD firm AnnealSys

As reported by Semiconductor Today: Riber S.A. of Bezons, France, which manufactures molecular beam epitaxy (MBE) systems as well as evaporation sources and effusion cells, has signed a distribution agreement with AnnealSys SAS of Montpellier, France, which specializes in vapour-phase chemical deposition processes.

The Annealsys MC050 is a 2-inch multi process system (DLI-CVD, DLI-ALD, MOCVD, RTP and RTCVD) offering the widest capabilities for development of new materials (source AnnealSys.com).

AnnealSys designs and produces rapid thermal annealing (RTA) furnaces and chemical vapour deposition (CVD) and atomic layer deposition (ALD) systems, which make it possible to deposit complex materials for a wide range of applications, from semiconductors to solar cells, LEDs and microsystems.

AnnealSys’ equipment is aimed primarily at research laboratories and universities, while also meeting the needs of industrial operators for producing small batches. Founded in 2004, the firm has built up unique CVD and ALD expertise, particularly for the integration of direct liquid injection vaporizers, making it possible to implement a wide variety of chemical precursors and to develop processes for growing new materials.

Initially, the partnership between Riber and AnnealSys will focus on CVD and ALD products and the American and Asian regions.

With this commercial agreement, AnnealSys is aiming to accelerate its sales growth internationally by capitalizing on Riber’s sales capabilities and reputation in the research community.

Riber says the agreement represents an opportunity for it to continue moving forward with its technical diversification into other thin-film deposition techniques. The firm says that the commercial partnership will strengthen the range of equipment and services that it offers. The development is also in line with the diversification strategy presented to shareholders at the latest general meeting.

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