HAM-LET is releasing its new Ultra Fast (UF) Diaphragm Valve for ALD

HAM-LET is releasing its new Ultra Fast (UF) Diaphragm Valve for Atomic Layer Deposition and fast switching applications, at Semicon West in San Francisco, booth no. 1539, from 8-10 July.

"Our UF's unique flow adjustment mechanism, patent pending no. US 61/910,79, allows for exceptional flow tuning during operation," said Eran Pintel, VP Marketing and Sales at HAM-LET.

"Another advantage of our UF diaphragm valve is its outstanding durability and low maintenance, as it offers over 100 million life cycles. The UF series meets the demand for high-precision diaphragm valves that can perform accurately and repeatedly over an extremely large number of cycles, required by ALD applications," said Pintel.

The optional extended bonnet and cooling fin provide a superb solution when precise and repeatable performance in high-temperature applications is required. The UF series offers superior sealing performance and remarkable durability in hazardous environments, under severe demands of ultra fast actuation at high purity applications.

HAM-LET will showcase a live demonstration of the UF series at Semicon West 2014, booth no. 1539.

About HAM-LET Group

Founded in 1950, HAM-LET Group specializes in the design, development production and marketing of high quality instrumentation valves and fittings in a wide variety of materials for high pressure, high temperature and vacuum applications. An accent on quality combined with ongoing research and development has given the company an international reputation for excellence. As a result, HAM-LET Group today is the fastest growing company in this industry. We are Totally Committed to our customers providing highest quality products and best of breed service. Our products are used around the world in a wide range of industries, including Energy, Oil & Gas, Ground Turbines, Chemical and Petrochemical, CNG/NGV, Semiconductor, Analytical and others.

Visit us at: http://www.ham-let.com