Sunday, July 6, 2014

JUSUNG Provides Etcher and TSD-CVD Deposition Equipment to CNSE

JUSUNG Provides Etcher and Single Type TSD-CVD Semiconductor Deposition Equipment to CNSE /SUNYIT

In accordance with Governor Andrew M. Cuomo’s commitment to maintaining New York State’s leadership in nanotechnology, the newly merged SUNY College of Nanoscale Science and Engineering (CNSE) / SUNY Institute of Technology (SUNYIT) today announced a strategic partnership agreement with JUSUNG Engineering Co., Ltd. which includes delivery of state-of-the-art equipment for use in production processes of nanoscale computer chips and the location of technical staff from Korea to the Albany Nanotech campus.

The $10M partnership, supported by 25 earchers and engineers in Korea and New York, focuses on improving manufacturing efficiency, which is a primary objective in semiconductor manufacturing. The JUSUNG etcher (Model name: Genaon Plus) represents a first-of-its-kind design that includes a core process tool to etch novel material metal layers. The cutting-edge tool enables significantly improved semiconductor chip efficiency that will set the standard for future production processes. In addition, JUSUNG employees stationed at the Albany Nanotech Complex will collaborate with researchers from the newly merged CNSE/SUNYIT and its global corporate partners to develop innovative etching and encapsulation techniques critical for advanced technology nodes.

“The addition of JUSUNG Engineering to our team of global semiconductor leaders and specifically to our processing equipment center is further testament to the technology powerhouse that Governor Cuomo continues to build in New York State,” said Dr. Michael Liehr, Executive Vice President of Innovation and Technology of the newly merged CNSE/SUNYIT. “JUSUNG is world renowned for its work in the semiconductor industry. Their contribution of technical expertise and cutting-edge tools further strengthens the newly merged CNSE/SUNYIT’s world-class capabilities, and we anticipate an exciting and mutually beneficial partnership.”

“Our collaboration with the newly merged CNSE/SUNYIT will have significant impact on semiconductor players around the world,” said JUSUNG CEO, Hwang Chul-joo. “The JUSUNG tool being delivered to CNSE is the first in the world that can provide a complete solution of etch and deposition of new metal materials for next-generation devices. Combined with the vast collection best in class tools and practices already in use at the Albany NanoTech campus, we will drive innovation in the global semiconductor industry while strengthening the next-generation semiconductor equipment market.”

The etcher and single type TSD-CVD to be supplied together is semiconductor deposition equipment that enables simultaneous space and time split while allowing for applicability to various processes including nitridation, oxidation, doping and metal electrode deposition functions on top of traditional Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD). Advantages include the absence of polymer residue after etching is complete; over 200 hours MTBC (Mean Time Between Cleaning); and absence of surface plasma damage.

The JUSUNG Genaon Plus is scheduled for arrival to the Albany NanoTech campus June 29, 2014.

Jusung has previoously supplied a Genaon Plus to CROCUS for MRAM stack ecting as reported here.

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