Saturday, May 3, 2014

3rd China ALD conference Shanghai, October 16 to 17, 2014

The 2nd International Conference on ALD Applications / 3rd China ALD conference will be a two-day meeting, dedicated to the fundamental, materials, and applications of Atomic Layer Deposition (ALD) technology. It will be held in Shanghai, China, from October 16 to 17, 2014. Following the success of the 1st and 2nd China ALD Scientific Meeting in 2010 and 2012, the 3rd China ALD 2014 conference will feature plenary sessions, poster sessions and an industrial exhibition.

Organization Commmittee:

ORGANIZING CHAIRS : Prof. Shi-Jin Ding and Prof. Yongfeng Mei
SECRETARY-GENERAL : Asso. Prof. Hongliang Lu and Asso. Prof. Feng Zhang

Invited Speakers (Confirmed)

Prof. Steve George, University of Colorado at Boulder
Title: Spatial Atomic Layer Deposition on Flexible Substrates Using a Modular Rotating Cylinder

Prof. Gregory Parsons, North Carolina University
Title: New Applications and Ab-Initio Reaction Mechanism Analysis for ALD onto Polymer Fibers and Films Abstract

Prof. Erwin Kessels, Technische Universiteit Eindhoven
Title: Surface chemistry during metal ALD: Opportunities for film growth, nanopatterning and nanoparticle synthesis

Prof. Christophe Detavernier, Ghent University
Title: Thermal and Plasma Enhanced Atomic Layer Deposition on Powders Abstract

Prof. Hyeongtag Jeon, Hanyang University
Title: Multi-density ALD Al2O3 Layer for OLED Abstract

Prof. Yukihiro SHIMOGAKI, University of Tokyo

Prof. Peide Ye, Purdue University
Title: ALD for State-Of-The-Art Nanoelectronics Abstract

Prof. Stacey F. Bent, Stanford University
Title: ALD of Nanoscale Materials for Energy Conversion Applications Abstract

Prof. Mato Knez, Nanoscience Cooperative Research Center

Prof. Jane P. Chang, University of California at Los Angeles
Title: Enabling the Synthesis and Integration of Multiferroic Materials by Atomic Layer Processing

Prof. Hyungjun Kim, Yonsei University
Title: Synthesis of 2D Transition Metal Disulfides (TMDSs) Nanosheets using Atomic Layer Deposition Abstract

Prof. Yong Wang, Nanjing Tech University
Title: Atomic layer deposition for the modification and functionalization of separating membranes: chances and challenges Abstract

Prof. Markku Leskela, University of Helsinki
Title: ALD for Energy Applications Abstract

Program is now available here.

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