Wednesday, January 10, 2018

Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations

Elsa Alvaro, Angel Yanguas-Gil  are done so you can stop what you are doing right now and check out the most interesting ALD publication in 2018! Find out what have been and what are the hot topics, materials applications, authors in the field of ALD. Also a big congratulations to the two most productive authors in scientific publishing in the field of ALD, Prof. Markku Leskelä and and Prof. Mikko Ritala of Helsinki University of Finland.

Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations [OPEN ACCESS]

Elsa Alvaro, Angel Yanguas-Gil
Published: January 10, 2018 
This paper describes how Atomic Layer Deposition (ALD) has evolved over time using a combination of bibliometric, social network, and text analysis. We examined the rate of knowledge production as well as changes in authors, journals, and collaborators, showing a steady growth of ALD research. The study of the collaboration network of ALD scientists over time points out that the ALD research community is becoming larger and more interconnected, with a largest connected component that spans 90% of the authors in 2015. In addition, the evolution of network centrality measures (degree and betweenness centrality) and author productivity revealed the central figures in ALD over time, including new “stars” appearing in the last decade. Finally, the study of the title words in our dataset is consistent with a shift in focus on research topics towards energy applications and nanotechnology. 

This is an open access article, free of all copyright, and may be freely reproduced, distributed, transmitted, modified, built upon, or otherwise used by anyone for any lawful purpose. The work is made available under the Creative Commons CC0 public domain dedication.
Number of papers (a) and journals (b) that publish ALD research, and percentage among SCIE papers (c) and journals (d). 
Top 10 most productive authors in ALD.