ALD FOR INDUSTRY 2025: Advancing Atomic Layer Deposition from Science to Industrial Applications in Dresden

The 8th International Conference "ALD for Industry" took place in Dresden from March 11 to 12, 2025, bringing together experts to discuss advancements in Atomic Layer Deposition (ALD) technology. In addition to the previously mentioned presentations, the conference featured several notable talks:

Prof. Fred Roozeboom

AlixLabs and Aether Semiconductor

Silicon Austria Labs

ASM International

The handshake

Prof. Riikka Puurunen

"Fundamentals of Atomic Layer Deposition: A Tutorial" by Prof. Riikka Puurunen

Prof. Riikka Puurunen from Aalto University, Finland, delivered a comprehensive tutorial on the fundamentals of ALD. She covered the history of ALD, its underlying surface chemistry, typical reaction mechanisms, and growth modes. Prof. Puurunen also discussed the role of diffusion in 3D structures and provided insights into surface reaction kinetics.

​In her tutorial titled "Fundamentals of Atomic Layer Deposition," Prof. Riikka Puurunen of Aalto University provided a comprehensive overview of ALD, a nanotechnology technique for precise surface modifications and thin coatings. She traced ALD's dual origins: Atomic Layer Epitaxy (ALE) developed by Tuomo Suntola in 1974, and Molecular Layering (ML) introduced by Valentin Aleskovskii and Stanislav Koltsov in the 1960s. The tutorial delved into the core principles of ALD, emphasizing its reliance on repeated, self-terminating reactions between gaseous reactants and surfaces. Prof. Puurunen categorized typical reaction mechanisms, discussed factors influencing saturation and growth modes, and highlighted "growth per cycle" (GPC) as a fundamental characteristic of ALD processes. She also explored the role of diffusion in complex 3D structures, noting how diffusion-limited growth can provide insights into surface reaction kinetics. The presentation available at Fundamentals of ALD: tutorial, at ALD for Industry, Dresden, by Puurunen 2025-03-11 | PPT

"Spatial ALD of IrO₂ and Pt Films for Green H₂ Production by PEM Electrolysis" by Dr. Paul Poodt

Dr. Paul Poodt, Chief Technology Officer at SparkNano, presented on the application of spatial ALD in fabricating iridium dioxide (IrO₂) and platinum (Pt) films. These materials are crucial for enhancing the efficiency of proton exchange membrane (PEM) electrolyzers used in green hydrogen production. Dr. Poodt highlighted how spatial ALD enables precise control over film thickness and composition, leading to improved performance and durability of electrolyzer components.

SparkNano’s CTO, Paul Poodt, presented on Spatial ALD of IrO₂ and Pt Films for Green H₂ Production by PEM Electrolysis on March 12 at 10:20 AM during the Emerging Applications session. Attendees had the opportunity to connect with him to discuss SparkNano’s spatial ALD technology.

"Advancements in ALD for Next-Generation Semiconductor Devices" by Dr. Christoph Hossbach

Dr. Christoph Hossbach from Applied Materials / Picosun Europe discussed recent progress in applying ALD techniques to next-generation semiconductor devices. His presentation covered the integration of ALD processes in manufacturing advanced transistors and memory devices, emphasizing the role of ALD in achieving atomic-scale precision and conformality required for modern microelectronics. 

"ALD Applications in Quantum Technology" by Dr. Martin Knaut

Dr. Martin Knaut of TU Dresden explored the utilization of ALD in developing components for quantum technologies. He highlighted how ALD's ability to deposit uniform and defect-free thin films is essential for fabricating qubits and other quantum devices, potentially leading to more stable and scalable quantum computing systems. 

"Emerging Applications of ALD in the Medical Field" by Dr. Mira Baraket

Dr. Mira Baraket from Atlant 3D presented on the potential of ALD in medical applications, including the development of biocompatible coatings for implants and drug delivery systems. She discussed how ALD can enhance the performance and safety of medical devices by providing precise control over surface properties.

Sources:

ALD for Industry 2025 – EFDS