In a recent interview with Daniel Nenni, Jonas Sundqvist, CEO and co-founder of AlixLabs, discussed the company’s pioneering role as the world’s only pure-play Atomic Layer Etch (ALE) equipment provider. Drawing on his academic background in ALD and CVD from Uppsala University, Sundqvist explained how AlixLabs’ APS (ALE Pitch Splitting) technology enables atomic-scale precision in semiconductor patterning. APS helps chipmakers reduce process complexity, lower costs by up to 40% per mask layer, and improve yield, particularly in advanced logic and memory manufacturing. As the industry pushes toward sub-10 nm nodes, APS offers a scalable and sustainable alternative to traditional multi-patterning and EUV lithography.
Sundqvist emphasized that AlixLabs addresses critical pain points in semiconductor production, such as increasing lithography costs, complexity, and sustainability concerns. By minimizing energy use, reducing fluorinated gas emissions, and improving process efficiency, APS supports a greener and more cost-effective manufacturing path. AlixLabs differentiates itself from giants like ASML and proponents of self-aligned multi-patterning by offering a complementary technology that simplifies patterning. The company is currently collaborating with major chipmakers and research institutes, preparing a Beta tool for pilot testing by late 2025 and targeting high-volume manufacturing between 2027 and 2029.
Sources:
CEO Interview with Jonas Sundqvist of AlixLabs - SemiWiki
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