3rd and Last Call for Papers, and List of Speakers / Symposium on ALD & ALE Applications #21, at 248th ECS Fall Meeting / Oct. 12-16, 2025 in Chicago, USA

This fall, the 248th ECS Meeting will be held on Oct. 12-16, 2025 in Chicago (IL, USA), and is expected to gather some 3,000 participants and 40 exhibitors from both academia and industry.

The conference has a strong focus on emerging technology and applications in both solid-state science & technology and electrochemistry.

• General information and the Meeting Program can be found here: Important Information and Call for Papers.
• For more information about our annual symposium G01 and the conference website: Meeting Information. 

The organizers of symposium G01 on “Atomic Layer Deposition & Etching Applications, 21” encourage you to submit your abstract(s) on topics, comprising but not limited to: 

1. Semiconductor CMOS applications: development and integration of ALD high-k oxides and metal electrodes with conventional and high-mobility channel materials; 

2. Volatile and non-volatile memory applications: extendibility, Flash, MIM, MIS, RF capacitors, etc.; 3. Interconnects and contacts: integration of ALD films with Cu and low-k materials; 

4. Fundamentals of ALD processing: reaction mechanisms, in-situ measurement, modeling, theory; 

5. New precursors, delivery systems & sustainability issues; 

6. Optical, photonic and quantum applications; applications aiming at Machine Learning, Artificial Intelligence 

7. Coating of nanoporous materials by ALD; 

8. Molecular Layer Deposition (MLD) and hybrid ALD/MLD; 

9. ALD for energy conversion applications such as fuel cells, photovoltaics, etc.; 

10. ALD for energy storage applications; 

11. Productivity enhancement, scale-up and commercialization of ALD equipment and processes for rigid and flexible substrates, including roll-to-roll and spatial processing; 

12. Area-selective ALD; 

13. Atomic Layer Etching (‘reverse ALD’) and related topics aiming at self-limited etching, such as atomic layer cleaning, etc. 

FYI: Last year at the PRiME 2024 Meeting in Honolulu, our symposium G01 on ALD & ALE Applications 20 attracted some 80 participants, attending a full 3-days schedule with 50 presentations (42 oral, of which 16 invited, plus 8 poster presentations). We expect to be at least as successful this Fall in Chicago. 

Abstract submission 

Meeting abstracts should be submitted not later than the deadline of March 28, 2025 via the ECS website: Submission Instructions

Submission Instructions Invited speakers A list of invited speakers follows below: 

Visa and travel For extensive information, see last year’s version: VISA AND TRAVEL INFORMATION

In addition, ECS’ Francesca Di Palo (francesca.dipalo@electrochem.org) can provide you with an official participation letter issued by the Electrochemical Society. For (limited) general travel grant questions, please contact travelgrant@electrochem.org. 

As in the past years, we expect also our symposium to be able provide some partial travel allowance to selected speakers. We are looking forward to meeting you all at our symposium G01 on ALD & ALE Applications 21, in Chicago | Oct. 12-16, 2025!