Saturday, January 4, 2025

2025 Book - Emerging Atomic Layer Deposition for Hydrogen Energy

The book "Emerging Atomic Layer Deposition for Hydrogen Energy" highlights several key applications where Atomic Layer Deposition (ALD) will play a transformative role in advancing hydrogen energy systems. In hydrogen production, ALD is utilized to improve water-splitting catalysts, including both electrochemical and photoelectrochemical (PEC) methods. By coating electrodes with thin, uniform layers, ALD enhances the efficiency and stability of the catalytic process. ALD is also applied to photoelectrodes in solar-driven water splitting to improve light absorption, charge separation, and durability. Additionally, ALD is used to modify proton exchange membranes (PEMs), enhancing their chemical stability and proton conductivity in fuel cells and electrolyzers.



In hydrogen storage, ALD plays a significant role by coating hydrogen storage materials such as metal hydrides, preventing degradation and improving absorption-release cycles. It is also used to create nanostructured hydrogen storage systems, which increase surface area and improve hydrogen uptake capacity. In fuel cell technology, ALD is employed to create thin, dense electrolyte layers in solid oxide fuel cells (SOFCs) and to improve electrode interfaces, enhancing their long-term stability. For proton exchange membrane fuel cells (PEMFCs), ALD helps reduce the use of expensive platinum group metals (PGMs) by improving the performance and durability of non-PGM catalysts. Similarly, ALD enhances the efficiency of alkaline fuel cells by creating durable, high-performing catalyst layers.

ALD may be critical in improving the performance of catalysts and electrodes used in hydrogen energy systems. It enables the coating of non-precious metal catalysts, enhancing their activity and stability. ALD also provides protective layers on catalysts to prevent degradation in harsh chemical environments, ensuring longer device lifespans. In the development of gas diffusion electrodes (GDEs), ALD improves conductivity, hydrophobicity, and corrosion resistance, making them more efficient for fuel cell applications. Furthermore, ALD can be used to create defect-free membranes for hydrogen purification, which are essential for separating and purifying hydrogen in industrial processes.

Other notable applications include the use of ALD in hydrogen sensors, where thin films created by ALD increase the sensitivity and durability of sensing materials. ALD also plays a key role in corrosion protection for hydrogen infrastructure, such as pipelines and storage tanks, by providing thin, protective layers that resist chemical degradation. In solar-driven hydrogen production, ALD improves the stability and efficiency of photocatalysts and enhances the performance of light absorbers by adding anti-reflective and passivation layers. Additionally, ALD is being explored for use in hybrid energy systems that combine hydrogen storage with battery technologies, further demonstrating its versatility in hydrogen-related applications. Overall, ALD’s precise control over material properties makes it a critical enabling technology for advancing hydrogen energy solutions.

Source:
The authors of "Emerging Atomic Layer Deposition for Hydrogen Energy" are primarily affiliated with the University of Johannesburg, South Africa. Dr. Peter Ozaveshe Oviroh holds a PhD in Mechanical Engineering Science from the University of Johannesburg and focuses on advanced material synthesis and energy systems. Dr. Sunday Temitope Oyinbo is a Specially Appointed Researcher at Kyoto University of Advanced Science in Japan, with expertise in hydrogen energy and materials engineering. Dr. Sina Karimzadeh is a Postdoctoral Research Fellow at the University of Johannesburg, contributing to research on thin-film deposition and nanomaterials. Dr. Patrick Ehi Imoisili is a Senior Lecturer and Researcher at the same institution, specializing in materials science and renewable energy technologies. Professor Tien-Chien Jen, also affiliated with the University of Johannesburg, is an accomplished academic recognized as an ASME Fellow, ASSAf Fellow, and SARChI Chair, with extensive expertise in hydrogen energy systems, nanotechnology, and thermal-fluid sciences. Together, the authors bring a diverse range of expertise in materials engineering, hydrogen energy, and atomic layer deposition technologies.

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