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A major cause of greenhouse gas emissions is process gas used in semiconductor wafer manufacturing comes from processing equipment such as reactive ion etching (RIE) and deposition (CVD and ALD). You can read and watch an interview here and study that paper that was recently published by me and my professor friends Henrik Pedersen and Sean Barry:
BALD Engineering - Born in Finland, Born to ALD: Green CVD: How Sustainable is Thin Film Deposition?
It is almost obvious that higher VPs at Samsung and TSMC (LINK) did just that ;-)
[Korea Herald, Link below] Advancing abatement technologies to reduce carbon emissions is the top priority in the Samsung Electronics semiconductor unit's goal to become carbon neutral by 2050, a top official said Friday.
"Treatment of gas used to manufacture semiconductor chips is our biggest focus in our spending (to achieve net-zero emissions)," Song Doo-guen, executive vice president and head of the Environment ＆ Safety Center at Samsung Electronics, told reporters at a briefing in Seoul.
- Samsung has pledged a 7 trillion won ($5 billion) investment to achieve its climate ambitions, and announced that it had recently joined RE100, a coalition comprising 380 global enterprises committed to becoming 100 percent renewable.
- Alongside the plan to cut direct carbon emissions, Samsung has also laid out a raft of plans to reduce indirect emissions, mainly by pursuing ultralow-power chip products.
- Other eco-conscious plans it has drawn up include capping the maximum use of freshwater to 300,000 tons a day by 2030 and eradicating gaseous and liquid pollutants by 2040 with treatment technology.
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