Atomic Layer Etching for Nano Device Fabrication at AlixLabs
We provide an ALE-based method of manufacturing nanostructures with a characteristic size below 20 nm.
This is a new method of nanostructure fabrication using the atomic layer etching process, which is inherently a damage-free etch process. The recently discovered etching process selectivity to inclined surfaces, allows to use walls of tapered structures as a mask. The inclined surfaces can be readily fabricated by e.g. dry etching or epitaxial growth, and will provide masking during the atomic layer etching process.
The key Tool for ALE development - An Inductively coupled plasma reactive ion etching (ICP-RIE) system Apex
SLR from Advanced Vacuum Systems AB. The system is designed for
controlled nanoscale etching of Si, SiO2, Si3N4,
W, Mo and polymers (resists) with fluorine-based chemistry. Unprotected
surfaces of the following materials are not allowed: glasses, noble
metals (Au, Ag, Pt, Cu, Pd), heavy metals (Cd, Pb, Zn) and certain types
of polymers (e.g. silicones). In total, 8 process gases are presently
available: SF6, CHF3, CF4, C4F8, Ar, O2, H2, N2. LINK
The inclined surfaces can be readily fabricated by e.g. dry etching or epitaxial growth, and will provide masking during the atomic layer etching process. This process therefore provides access to fabrication of extremely small structures in a very precise and efficient way.
AlixLabs is a user at Lund Nanlo Lab, Lund University, Sweden
Lund Nano Lab (LNL) is an open research facility that is available to both academic research groups, start-up and company users. Our world-class clean room facility is equipped with state-of-the-art semiconductor processing and metrology equipment.
- ISO 5 and ISO 7 cleanroom facility for cutting edge nano- and micro-fabrication
- 24/7 access for accredited academic research and company users
- Fabrication and analysis of structures on the micro- and nanometer-scale
- Wide range of equipment for Growth, Lithography, Deposition, Etch and Characterisation
- Centre of excellence for Epitaxial growth of III-V materials
- Industrial product development and prototype testing
- Staffed by expert equipment and process experts available to provide user training
Lund Nano Lab is one of the main resources within NanoLund and provides support to research groups in strategically important areas of research such as:
- Nanowire growth and material science
- Fundamental and device physics, electronics and photonics
- Nano-bio and life science
- Exploratory nanotechnology
- Growth and physics of new materials
- Nanowire-based photovoltaics
- Processing of nanoelectronic devices and circuits
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