Monday, February 4, 2019

Extended deadline for ASD 2019 Workshop

We are pleased to announce that the deadline for ASD abstract submission has been extended until Sunday 10 February. This means you have an extra ten days to finalize your abstracts and submit them at:

The workshop will feature the following invited speakers:

Rudy J. Wojtecki (IBM, USA), Katie Nardi (LAM Research, USA), Kanda Tapily (TEL, USA), Chi-I Lang (AMAT, USA), John Tolle (ASM, USA), Han-Bo-Ram Lee (Incheon National University), Gregory Parsons (NC State University, USA), Matthias Minjauw (University of Gent, Belgium), Necmi Biyikli (University of Connecticut, USA), Mohamed Saib (IMEC, Belgium), Efrain A. Sanchez (IMEC, Belgium), John G. Ekerdt (University of Texas, USA).

The workshop will cover a wide range of topics, including the following:

Area selective epitaxy and area selective chemical vapor deposition: processes and mechanisms, defects control

Intrinsic selectivity of ALD processes: nucleation and interface studies, chemical selectivity in surface reactions, competitive adsorption, precursors design, modeling of surface reactions

Methods for area selective activation / deactivation: use of inhibitors (self-assembled monolayers, polymers), plasma-/beam-induced activation

Processes and mechanisms for area selective atomic layer deposition: deposition of metals or dielectrics, thermal/plasma enhanced ALD, 3D or patterned substrates, substrates preparation, sequential deposition/etching,

Metrology and defects control: surface characterization techniques, selective etching of defects

Applications of area selective deposition: semiconductor industry (integration needs of device makers, solutions proposed by the equipment makers), catalysis, energy generation and storage, etc.

On behalf of the organizing committee, it will be our pleasure to welcome you in Leuven.

Andrea Illiberi Program Chair of the 4th ASD workshop

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