Invited speakers and tutorials for AVS ALD & ALE 2018 in Incheon Korea

The invited speakers and tutorials for AVS ALD & ALE 2018 in Incheon Korea have been announced! Please follow the link here for full details (LINK). A lot of experts from the South Korean ALD Industry and Fabs will present, including offcourse the early industry adopters (DRAM!) Samsung Electronics and SK Hynix as well as suppliers like Wonik IPS and UP Chemical and a good mix of the worlds best experts will be there as well ALD and ALE. Noting also that there will be multiple presentations from Japan for ALE like Sony (cool!), Toshiba and Tokyo Electron.

As for other years the exhibition has been sold out but sponsoring is open!

SUBMISSION for abstarcts deadline is also close - February 16, 2018 (LINK)

ALD & ALE Plenary Speakers and Schedule

Monday, July 30, 2018

8:15-8:30	ALD Opening Remarks
8:30-9:15	Seung Ho Pyi (SK Hynix, South Korea)
9:15-10:00	Jin Sung Chun (Wonik IPS, South Korea)
10:00-10:15	Break
10:15-10:30	ALE Opening Remarks
10:45-11:30	“Semiconductor Manufacturer’s View and Entreaty to Atomic Layer Etcher,” Masayuki Tomoyasu (Samsung Electronics, South Korea)

ALD Invited Speakers

• Jae-Young Ahn (Samsung Electronics, South Korea)
• Sean Barry (Carleton University, Canada)
• Mikhael Bechelany (IEM-CNRS, France)
• John Conley (Oregon State University, USA)
• Neil Dasgupta (University of Michigan, USA)
• Christophe Detavernier (Ghent University, Belgium)
• Hyungchul Kim (SK Hynix, South Korea)
• Bong Jin Kuh (Samsung Electronics)
• Min Hwan Lee (University of California, Merced)
• Adrie Mackus (Eindhoven University, The Netherlands)
• David Munoz-Rojas (LMGP-CNRS, France)
• TaeJoo Park (Hanyang University, South Korea)
• Paul Poodt (TNO/Hoist Center, The Netherlands)
• Yong Qin (Institute of Coal Research, Chinese Academy of Sciences, China)
• Xueliang Sun (University of Western Ontario, Canada)

ALE Invited Speakers

• Sumit Argarwal (Colorado School of Mines)
• Robert Bruce (IBM, USA)
• Simon Elliot (Tyndall National Institute, Ireland)
• Masanaga Fukasawa (Sony Semiconductor Solutions Corp., Japan)
• Hiroyuki Fukumizu (Toshiba, Japan)
• Yoshihide Kihara (TEL, USA)
• Jongchul Park (Samsung Electronics, South Korea)
• Alex Schrinsky (Micron, USA)

ALD & ALE Tutorial Speakers and Schedule

Sunday, July 29, 2018

1:00-1:05	Tutorial Welcome
1:05-1:50	“Overview of ALD Applications,” ChunHwan Kim (SK Hynix, South Korea)
1:50-2:35	“Overview of ALD Precursors,” Wonyong Koh, (UP Chemical, South Korea)
2:35-3:20	“In situ Studies of ALD Processes and Reaction Mechanisms,” Erwin Kessels (University of Eindhoven, The Netherlands)
3:20-3:40	Break
3:40-4:25	“Overview of Area Selective Deposition,” Gregory N. Parsons (North Carolina State University, USA)
4:25-5:10	“Impact of ALE on Process Tool Design – a Tutorial,” Mike Cooke (Oxford Instruments, USA)
5:10-5:55	Peter L.G. Ventzek (TEL, USA)