Message from the co-chairs of ALE2017: The 4th International Atomic Layer Etching Workshop (ALE2017) will be in Denver, Colorado on July 15-17, 2017. ALE2017 will be held in conjunction with ALD2017. The abstract submission deadline for ALE2017 is February 17, 2017. Details are posted on the conference website at: https://aldconference.avs.org/.
Please submit your abstracts to ALE2017 on the focus topics including: plasma and/or energy-enhanced ALE; gas-phase and/or thermal ALE; solution-based including wet ALE; selective ALE; ALE hardware, diagnostics, & instrumentation; modeling of ALE; atomic layer cleaning (ALC); integration of ALD + ALE; and applications for ALE.
We will have an exciting ALE2017 workshop. We have 12 invited speakers that are given below.
We look forward to your contributed abstracts and seeing you in Denver at ALE2017.
We will have an exciting ALE2017 workshop. We have 12 invited speakers that are given below.
- Stacey Bent (Stanford Univ.)
- Yves Chabal (Univ. of Texas, Dallas)
- Jane Chang (UCLA)
- Robert Clark (Tel)
- Jesus del Alamo (MIT)
- Masanobu Honda (Tel)
- Nitin Ingle (AMAT)
- Mark Kushner (Univ. Michigan)
- Younghee Lee (Univ. Colorado)
- Nathan Marchack (IBM)
- Sumeet Pandey (Micron)
- Chuck Winter (Wayne State Univ.)
We look forward to your contributed abstracts and seeing you in Denver at ALE2017.
Regards,
Steve George and Keren Kanarik Co-Chairs of ALE2017
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