Sunday, September 11, 2016

Atomic Level Processing at SEMICON Europa in Grenoble

As usual at SEMICON Europa there will be many presentations given on ALD and Atomic Level Processing. This year SEMICON is running in Grenoble and Tuesday will be a busy day for all ALD guys. First there is the annual ALD Symposium now rebranded as "Symposium of The ALD Lab Saxony - Workshop on Atomic Layer Processing". Then in the afternoon Hessel Spray from ASM International takes over the show and chairs the Advanced Materials Session in the Tech Arena.

See below for more details on each event! 

Symposium of the ALD Lab Saxony

Workshop on Atomic Layer Processing


Date: 25 October 2016
Time: 9:00–13:00
Location: Le Bans

Pleas get in contact with Prof Bartha and Christoph Hossbach at IHM TU Dresden for more information about this event.

Web :
ALD Lab Saxony :

Advanced Materials Session

Date: 25 Oct 2016
Time: 14:00–17:00
Location: TechARENA 2



Chair Hessel Sprey, Manager European Cooperative Programs and External R&D, ASM International
14:00 Introduction
Molecular self-assembly from liquids on atomically flat surfaces: from fundamentals to applications
  Brandon Hirsch, postdoctoral researcher, KU Leuven
2D and graphene - Status of the Graphene Flagship and the potential applications
  Kari Hjelt, Head of Innovation, Graphene Flagship / Chalmers University
Advanced materials processing with ALD and CVD precursors
  Jean-marc Girard, CTO, Air Liquide
III-V selective area growth on Si: from Logic to Photonic applications
  Clement Merckling, Principle Scientist, imec
Hot-Wire Assisted ALD: From Idea to Realization
  Alexey Kovalgin, Associate Professor, MESA+ Institute For Nanotechnology, University of Twente
Atomic Layer Deposition and Etching of Thin Films - Research and Application
  Christoph Hossbach, Senior Scientist, Technische Universität Dresden
Development of block copolymers to create complex
  Michael Morris, Director, AMBER Research Centre, AMBER, Trinity College Dublin
17:00 Closing
  Johan Dekoster, Program Manager, imec
17:05 END

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