Friday, September 23, 2016

The second Belux workshop is organized the 17th and 18th November 2016 at imec

The second Belux workshop is organized the 17th and 18th November 2016 at imec in Belgium with the objective to spark synergy between modeling, deposition and characterization of emerging transition metal compounds for next generation technologies. Innovative materials are expected to enable novel device concepts and breakthrough ideas for future logic and memory applications. 
More about this event is to be found under:

Materials of interest for workshop include:
• Advanced ferromagnetic materials, including high PMA materials and Heusler alloys.
• Strongly correlated transition metal oxides, including Mott materials.
• Novel dielectrics for microelectronics, including dielectrics for resistive memory and flash devices.
• Novel lead-free and/or HfO2-based ferroelectric materials.
• Chalcogenide glasses for selector devices.
• Two-dimensional transition metal dichalcogenides (e.g. MoS2).

Areas of interest:
• Deposition: novel precursors and processes, growth surface dependencies, impact of process parameters on the layer properties.
• Characterization: phase formation, interface characterization, optical characteristics, stress characterization, magnetic properties, stress formation, material defectivity.
• Modeling: theoretical calculations such as DFT to improve the understanding of precursor reactivity, deposition or material properties.
• Chemical etching and surface functionalization of chalcogenide compounds.
The workshop consists of a combination of presentations and posters.

COST Action MP1402 - HERALD

Hooking together European research in Atomic Layer Deposition

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