Tuesday, March 12, 2019

Review—Cobalt Thin Films: Trends in Processing Technologies and Emerging Applications

Here is a fantastic revie on Cobalt ALD and CVD from SUNY Polytechnic Institute and Gelest and it is fee to download - Thanks for sharing this one Henrik Pedersen!
 
Editors' Choice—Review—Cobalt Thin Films: Trends in Processing Technologies and Emerging Applications
Alain E. Kaloyeros, Youlin Pan, Jonathan Goff and Barry Arkles
ECS Journal of Solid State Science and Technology, 8 (2) P119-P152 (2019) (LINK)

Cobalt metallic films are the subject of an ever-expanding academic and industrial interest for incorporation into a multitude of new technological applications. This report reviews the state-of-the art chemistry and deposition techniques for cobalt thin films, highlighting innovations in cobalt metal-organic chemical vapor deposition (MOCVD), plasma and thermal atomic layer deposition (ALD), as well as pulsed MOCVD technologies, and focusing on cobalt source precursors, thin and ultrathin film growth processes, and the resulting effects on film composition, resistivity and other pertinent properties.
 
Open access article distributed under the terms of the Creative Commons Attribution 4.0 License (CC BY, http://creativecommons.org/licenses/by/4.0/)

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