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High k Workshop 2019
NaMLab invites to the Novel High-k Application Workshop on June 11th and 12th, 2019. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics were discussed by more than 90 participants from industry, research institutes and universities.
In this series of annual workshops NaMLab has created a stimulating
platform for application-oriented scientists to exchange ideas and
discuss latest experimental results on MIM-capacitors, process
technology, leakage & reliability as well as characterization of
high-k dielectrics integrated in silicon based micro– and
nanoelectronics. The ferroelectric properties of doped HfO2 and ZrO2
were discovered more than 10 years ago. On the second day of the
workshop, root causes for the formation of this so far unknown phase
will be discussed together with the application of these films.
For more information: LINK
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