Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that Osram Opto Semiconductors GmbH of Regensburg, Germany has ordered a multi-reactor Propel High-Volume Manufacturing (HVM) gallium nitride (GaN) metal-organic chemical vapor deposition (MOCVD) system, as well as K475i MOCVD systems.
The K475i system incorporates Veeco’s Uniform FlowFlange technology, producing films with very high uniformity and improved within-wafer and wafer-to-wafer repeatability with what is claimed to be the industry’s lowest particle generation for demanding applications like photonics and advanced LEDs.
Source: Semiconductor Today LINK
Incorporating proprietary TurboDisc and Uniform FlowFlange™ MOCVD technologies, the new K475i system enables Veeco customers to reduce LED cost per wafer by up to 20 percent compared to alternative systems through higher productivity, best-in-class yields and reduced operating expenses. (Source: Veeco LINK)