Wednesday, February 8, 2017

Call for abstracts ALE2017 in Denver, USA on July 15-17

Message from the co-chairs of ALE2017: The 4th International Atomic Layer Etching Workshop (ALE2017) will be in Denver, Colorado on July 15-17, 2017. ALE2017 will be held in conjunction with ALD2017. The abstract submission deadline for ALE2017 is February 17, 2017. Details are posted on the conference website at:

Please submit your abstracts to ALE2017 on the focus topics including: plasma and/or energy-enhanced ALE; gas-phase and/or thermal ALE; solution-based including wet ALE; selective ALE; ALE hardware, diagnostics, & instrumentation; modeling of ALE; atomic layer cleaning (ALC); integration of ALD + ALE; and applications for ALE.

We will have an exciting ALE2017 workshop. We have 12 invited speakers that are given below.

  • Stacey Bent (Stanford Univ.)
  • Yves Chabal (Univ. of Texas, Dallas)
  • Jane Chang (UCLA)
  • Robert Clark (Tel)
  • Jesus del Alamo (MIT)
  • Masanobu Honda (Tel)
  • Nitin Ingle (AMAT)
  • Mark Kushner (Univ. Michigan)
  • Younghee Lee (Univ. Colorado)
  • Nathan Marchack (IBM)
  • Sumeet Pandey (Micron)
  • Chuck Winter (Wayne State Univ.)

We look forward to your contributed abstracts and seeing you in Denver at ALE2017. 

Steve George and Keren Kanarik Co-Chairs of ALE2017

No comments:

Post a Comment