Thursday, June 2, 2016

ALD Lab Saxony at ALD2016

ALD Lab Saxony presenting oral presentations at ALD2016


Wege, Stephan
plasway-Technologies GmbH, Germany
Plasma Processing Reactor Design
Sunday 24 July: Tutorial: Plasma processing - Sunday 24 July 14:15-15:45
14:45-15:15

Hossbach, Christoph
TU Dresden, Institute of Semiconductors and Microsystems, Germany
Organic electronic devices with inorganic high-k gate oxides grown by Atomic Layer Deposition
Tuesday 26 July: High-k dielectrics 1 - Tuesday 26 July 08:45-10:15
09:15-09:30

Junige, Marcel
Technische Universität Dresden, Germany
The ALD of Ru and RuO2 – An intertwined special case
Wednesday 27 JULY: Noble metals - Wednesday 27 July 08:15-10:15
09:15-09:30

Knaut, Martin
Technische Universtität Dresden, Institute of Semiconductors and Microsystems, Germany
Atomic layer deposition and 3D nanoscale substrates - nanowires, nanotubes and nanopores
Wednesday 27 JULY: High aspect ratio nanostructures - Wednesday 27 July 16:00-17:30
16:00-16:15