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Friday, March 2, 2018
Call for Abstracts - 3rd Area Selective Deposition Workshop (ASD 2018)
Thursday, March 1, 2018
2017 was a year of recovery in ALD business driven by 3DNAND according to ASMI
Today was the ASM International NV (OTCQX:ASMIY) Q4 2017 Earnings Conference Call for analysts. The call has been transcripeted by Seeking Alpha (LINK). All in all 2017 was a good year for ALD single wafer market and showed recovery from 2016. Here is some important take aways from Peter van Bommel - CFO, during teh call:
- Looking at the company's financial performance, 2017 was a year of recovery in our ALD business. In particular, driven by strong increases in the 3D NAND segment. 2017, we also successfully increased our addressable market in epitaxy as we rolled our first leading high volume manufacturing customer for our new Intrepid too. Initial cost related to new product launches impacted to the gross margin but we still increased our operating profits by 38% in 2017.
- In terms of product lines, the key driver was our ALD business, at some distance followed, by Epi and PECVD. Our net sales in 2017 increased by 23% to a new record high of €737 million. Sales were led by our ALD product line, which continued to represent clearly more than half of our equipment revenue.
ASM earnings call slide (sceeen dump from Seeking Alpha LINK)
- By industry segment, the revenue stream in the fourth quarter was led by memory customers, largely 3D NAND, followed by foundry. Looking at the roadmaps of our customers, the introduction of complex 3D devices structures and new materials and further scaling, will drive the need for more precise deposition of ultrathin and highly comfortable films. This place is the strength of ALD. And as a leader in the single wave of ALD market, our company remains well-positioned to capture the growth expected in this market.
Looking ahead the addressable market for single wafer ALD will grow according to Peter van Bommel since the advanced node share (14, 10 and 7 nm) will grow to roughly 50% in revenue by 2020-2021 of the total wafer fab equipment spending, when ASM expect the single wafer ALD market to reach USD 1.5 billion annual revenue (see graph below, Gartner Dec 2017).
ASM earnings call slide (sceeen dump from Seeking Alpha LINK)
Not touched upon too
much was the Large Batch furnace segment which is dominated by the
competitors Tokyo Electron and Hitachi Kokusai. This segment is however much smaller than the single wafer ALD segement, maybe 70:30 ratio or so. The patent disagreement
with the Hitachi Kokusai was briefly mentioned but nothing substantial
was said since it is an ongoing issue (LINK).
Beneq offers online training in Atomic Layer Deposition
Train yourself online on ALD - Introducing Beneq Thin Film Solutions webinar series
As experts of Atomic Layer Deposition and thin film coatings, we get a lot of questions about ALD from our customers and partners as well as students and other people with an interest in nanotechnology. The questions and information requests range from very general questions about the ALD technology and its application possibilities to extremely detailed thin film research problems.
We will of course try to help the best we can, but it is not always possible to answer personally to everybody, which is why we try to share information about the benefits of ALD in our blog and the technology and research pages of our website.
1. Beneq TFS 200 ALD research equipment - Options and Upgrades
Wednesday, March 21st at 3.00 PM EET
In this webinar, Timo Rantasalmi, Head of Customer Services, will walk you through the available option and upgrades with concrete examples of their use and benefits.
2. Introduction to Beneq Coating Services
Wednesday, April 4th at 3.00 PM EET
In this webinar, Dr. Erik Østreng, Head of Coating Services, will explain the benefits of using Beneq Coating Services, introduce the typical coating service solutions and tell you how to get started.
Beneq Webinar Page for full details LINK
Wednesday, March 21st at 3.00 PM EET
In this webinar, Timo Rantasalmi, Head of Customer Services, will walk you through the available option and upgrades with concrete examples of their use and benefits.
2. Introduction to Beneq Coating Services
Wednesday, April 4th at 3.00 PM EET
In this webinar, Dr. Erik Østreng, Head of Coating Services, will explain the benefits of using Beneq Coating Services, introduce the typical coating service solutions and tell you how to get started.
Beneq Webinar Page for full details LINK
Monday, February 26, 2018
ALD/CVD Chemielaborant/in bei Fraunhofer IKTS in Dresden
Die Fraunhofer-Gesellschaft ist die führende Organisation für angewandte Forschung in Europa. Unter ihrem Dach arbeiten 72 Institute und Forschungseinrichtungen an Standorten in ganz Deutschland. Mehr als 25 000 Mitarbeiterinnen und Mitarbeiter erzielen das jährliche Forschungsvolumen von 2,3 Milliarden Euro. Davon fallen knapp 2 Milliarden Euro auf den Leistungsbereich Vertragsforschung. Rund 70 Prozent dieses Leistungsbereichs erwirtschaftet die Fraunhofer-Gesellschaft mit Aufträgen aus der Industrie und mit öffentlich finanzierten Forschungsprojekten. Internationale Kooperationen mit exzellenten Forschungspartnern und innovativen Unternehmen weltweit sorgen für einen direkten Zugang zu den wichtigsten gegenwärtigen und zukünftigen Wissenschafts- und Wirtschaftsräumen.
In der Arbeitsgruppe Dünnschicht-Technologien werden hauptsächlich chemische Gasphasenabscheidung (CVD) für verschiedene Anwendungsfelder eingesetzt bzw. entwickelt. Dabei kommen die Verfahren thermische CVD-Prozesse bei reduziertem oder Atmosphärendruck (LPCVD, APCVD), plasmagestütztes CVD (PACVD) und Atomlagenabscheidung (ALD) zum Einsatz. Werkstoffseitig stehen Hartstoffschichten, Schichten aus gerichteten Carbon Nanotubes (CNT) und nanoskalige Dielektrika auf der Basis von Hafnium-, Zirkon- und Titanoxiden sowie von Perowskiten im Mittelpunkt. Die Anwendungen reichen vom Verschleißschutz über die Aktorik, Sensorik, Batterie- und Energietechnik bis hin zur Mikroelektronik. Die Herstellung neuer Dünnschichtmaterialien erfordert auch die Modifizierung bekannter bzw. die Entwicklung neuer CVD-Technologien. Dies umfasst den Test neuer Precursorsysteme sowie die Durchführung detaillierter Parameterstudien. Unterstützt werden die Untersuchungen durch thermodynamische Berechnungen und durch eine umfassende Charakterisierung von Zusammensetzung, Struktur und Eigenschaften der Schichten.
Künftig umfassen Ihre Aufgaben hierbei
Künftig umfassen Ihre Aufgaben hierbei
- Eigenständiger Aufbau, Betrieb und Wartung von Laboraufbauten und Versuchsdurchführung nach Ablaufplan
- Mitarbeit bei der Auswahl und Definition der wissenschaftlichen Ausrüstung und Chemikalien
- Anpassung der Laboranlagen an Projekterfordernisse
- Unterstützung bei der Fehlerbehebung an Anlagen
- Bereitstellung und Pflege technischer Dokumentationen
- Auswahl und Koordination externer und interner Lieferanten und Dienstleister
- Bestellung von Bauteilen und Wartung von für den Anlagenbetrieb notwendigen Zusatzgeräten
Saturday, February 24, 2018
ASM International announces response to Hitachi Kokusai´s counterclaim
ASM International N.V. (Euronext Amsterdam: ASM) today responds to press reports of a patent infringement suit against ASM filed by Hitachi Kokusai in Federal District Court for the District of Oregon on February 20, 2018. The claim follows an earlier suit for patent infringement filed by ASM against Hitachi Kokusai and ASM's earlier initiation of an arbitration against Hitachi Kokusai alleging breach of a license agreement between the parties. ASM will diligently prosecute its cases against Hitachi Kokusai and will vigorously defend against Hitachi Kokusai's claims, which, ASM believes lack merit.
In 2007, ASM and Hitachi Kokusai entered into a licensing agreement, according to which ASM granted usage of its ALD patents in the field of use of batch ALD to Hitachi Kokusai.
On August 30, 2017, ASM initiated an arbitration with the American Arbitration Association against Hitachi Kokusai for breach of the license agreement between the parties. It is not yet known when the arbitration will be completed.
In 2007, ASM and Hitachi Kokusai entered into a licensing agreement, according to which ASM granted usage of its ALD patents in the field of use of batch ALD to Hitachi Kokusai.
On August 30, 2017, ASM initiated an arbitration with the American Arbitration Association against Hitachi Kokusai for breach of the license agreement between the parties. It is not yet known when the arbitration will be completed.
Following the expiration of the parties' patent license agreement, ASM filed, on December 1, 2017, a suit for patent infringement against Hitachi Kokusai and its U.S. subsidiary in the U.S. District Court for the Northern District of California. ASM asserted three patents. ASM has requested both an injunction and monetary damages.
CMC Conference 2018 - a Critical Event for Semiconductor Materials
Critical Event for Semiconductor Materials
CMC Conference Update
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This year's Critical Materials Conference features:
Keynote Speaker: David Bloss, VP, Technology and Manufacturing Group Director, Lithography Technology Sourcing, Global Supply Management, Intel Corporation, presenting
"Patterning Challenges and Fab Materials for Future ICs"
Also Featuring:
and the popular Not-so-unusual Round Table Session - a highly differentiated program, with networking opportunities for all attendees.
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The CMC Conference provides:
* Updates on market dynamics and regulations
* Trends in the profitable control of all fab materials
* Technology forecasts for future critical materials
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Schedule Details:
Welcome Reception April 25th evening
Sessions I & II, April 26th
Session III, April 27 morning
Welcome reception, lunch on 26th & coffee/tea breaks are included.
The
conference follows the CMC Fabs F2F meeting (on April 24-25) and CMC
Members only (Associates and Fabs) Joint Session (on April 25, 2-5pm),
located nearby at NXP. For more information about these meetings and/or
the Conference, please contact Meena Sher by email by clicking here.
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Standard Price $450
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