MSP Launches Turbo II™ Vaporizers: Next-Gen Efficiency for Semiconductor Fabrication

MSP, a Division of TSI, has introduced the Turbo II™ Vaporizers, transforming vapor delivery for chemical vapor deposition (CVD) and atomic layer deposition (ALD) in semiconductor manufacturing. These vaporizers handle a variety of liquid precursors, including thermally sensitive ones, and boast a 200% increase in vapor output with half the size of previous models. They offer higher vapor concentrations, quicker stabilization, and faster deposition times, reducing wafer processing time and liquid waste. Additionally, the vaporizers are designed to decrease downtime and maintenance, offering a lower total cost of ownership and significant long-term cost savings. MSP's product line includes various vaporizers, VPG filters, liquid flow controllers, and semiconductor metrology equipment.

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MSP Unveils Turbo II™ Vaporizers (globenewswire.com)