Program release - EFDS ALD for Industry 2020 in Freiburg, Germany (March 31-April 1)

A topical workshop with a focus on industrialization and commercialization of ALD for current and emerging markets

Atomic Layer Deposition (ALD) is used to deposit ultraconformal thin films with sub-nm film thickness control. The method is unique in the sense that it employs sequential self-limiting surface reactions for growth in the monolayer thickness regime. Today, ALD is a critical technology in leading-edge semiconductor technology, and the field of application in other industries is increasing rapidly. According to the market estimates, the equipment market alone is currently at an annual revenue of US$ 1.8-1.9 billion (2018), and it is expected to double in the next 4-5 years. In a European context, ALD was invented independently twice in Europe (Russia & Finland), and since the last 15 years, Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment, and end-users.

Keynote: Prof. Henrik Pedersen, Linköping University

Tutorials by : Bochum University, Lund University, Uppsala University, Oxford Instruments, TECHCET / Fraunhofer IKTS 

Presentations by: Air Liquide, BASF, CEA Leti, Encapsulix, Picosun, Veeco, Sentech, Beneq, Fraunhofer IPMS-CNT, Positive Coating, ATLANT 3D Nanosystems, Fraunhofer FMD 

This year we will organize the 4th Workshop „ALD For Industry“ in South Germany (Freiburg), much closer to the other ALD hubs in continental Europe in France, The Netherlands, Belgium, Italy, and Switzerland. ALD for Industry provides the opportunity to get in contact with industrial and academic partners to learn more about the fundamentals of ALD technology and to get informed about recent progress in the field. The Event will focus on the current markets for ALD and addresses the applications in the Semiconductor industry, MEMS & Sensors, Battery Technology, Medical, Display, Lightning, Barriers, and Photovoltaics.

Program and Information: LINK

ALD Industrial Exhibition (more in the pipeline):