[Press release, Nanexa AB LINK] The US Patent Office has today approved another patent application for Nanexa. The currently approved patent has broader protection than the patent that was approved earlier this year and includes the use of PharmaShell® products for multiple administration methods, such as parenteral injection, inhalation, and oral preparations.
The US Patent Office has issued a patent on November 19, 2019. The now approved patent covers the product itself, PharmaShell® as well as the method for its manufacture and formulations of PharmaShell® coated drugs.
The company’s CEO David Westberg comments:
The currently approved patent relates to PharmaShell®, which is administered in a variety of ways, for example, by parenteral injection, inhalation, and oral preparations. This means broadening our patent protection and creating further opportunities for commercial agreements going forward.
The technology used by Nanexa to manufacture the shells that make up PharmaShell® is Atomic Layer Deposition (ALD). In ALD, reactive gases are used, which, with atomic layer by atomic layer, build up a surface coating with high precision. ALD has been used in the electronics industry for decades and is thus well established for larger-scale production and automation.
ALD can also be used at low temperatures, down to room temperature, unlike other surface coating techniques, which usually use considerably higher deposition temperatures, thereby risking inactivating the drug. A further advantage of ALD is that the coating is carried out under dry conditions, which makes it possible to coat drugs that are quickly dissolved in water or other solvents.
By building up an atomic layer for the atomic layer with ALD, the thickness of the coating can be controlled with extremely high precision. Drug particles of various sizes and shapes can be coated since the only thing required for coating to be formed is that the reaction gases can reach the surface.
ALD can also be used at low temperatures, down to room temperature, unlike other surface coating techniques, which usually use considerably higher deposition temperatures, thereby risking inactivating the drug. A further advantage of ALD is that the coating is carried out under dry conditions, which makes it possible to coat drugs that are quickly dissolved in water or other solvents.
By building up an atomic layer for the atomic layer with ALD, the thickness of the coating can be controlled with extremely high precision. Drug particles of various sizes and shapes can be coated since the only thing required for coating to be formed is that the reaction gases can reach the surface.
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