The AVS
19th International Conference on Atomic Layer Deposition (ALD 2019) featuring
the 6th International Atomic Layer Etching Workshop (ALE 2019) will
be a three-day meeting dedicated to the science and technology of atomic
layer controlled deposition of thin films and now topics related to atomic
layer etching. The conference will take place Sunday, July
21-Wednesday, July 24, 2019, at the Hyatt Regency Bellevue in Bellevue, Washington (East
Seattle).
As in past
conferences, the meeting will be preceded (Sunday, July 21) by one
day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday,
July 22-24) along with an industry tradeshow. All presentations will be
audio-recorded and provided to attendees following the conference (posters
will be included as PDFs). Anticipated attendance is 800+.
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