Tuesday, December 4, 2018

The 7th ALD Symposium by ALD Lab Saxony 10th of December 2018 in Dresden

The 7th ALD Symposium will be organized by ALD Lab Saxony and the working group R&D of Silicon Saxony, 10th of December 2018 in Dresden / Germany. 
 

Registration: LINK
 
Location :

Technische Universität Dresden
- Werner-Hartmann-Bau -
Nöthnitzer Str. 66
01187 Dresden 
 
Program 14:00 - 18:00
 
Welcoming
Stefan Uhlig/Cool Silicon

ALD/CVD applications, equipment and precursors in high volume manufacturing
Dr. Jonas Sundqvist/ Fraunhofer IKTS

ALD activities within Research Fab Microelectronics Germany FMD
Bernd Hintze/ Forschungsfabrik Mikroelektronik Deutschland

Atomic layer deposition @ IFW
Andy Thomas/ Leibniz-Institut für Festkörper- und Werkstoffforschung

TSV-Transistor
Felix Winkler/ Technische Universität Dresden, Institut für Halbleiter und Mikrosysteme

BREAK (15:05-15:20)

Synthesis of self-assembled 3D nanostructures using metastable atomic layer deposition
Mario Ziegler/ Leibniz-Institut für Photonische Technologien Jena

ALD layers for reduced wear on micro cutting tools
Toni Junghans/ Westsächsische Hochschule Zwickau

Zr precursor screening for semiconductor applications
Monica Materano/ NamLab

WORLD CAFE (16:00-18:00)
Station 1 – the future of ALX 2019/2020
Station 2 – ALD R&D projects ideas
Station 3 – Internationalisation (players, cooperations, events etc.)

Wrap up world café
Stefan Uhlig/ Cool Silicon

Networking (18:00 - open end): After the official parts, we would be very happy if you accompany us to a trip over the 584. Dresdner Striezelmarkt 2018 and enjoy some networking with a hot cup of delicious mulled wine