Novel plasma processes for nanoelectronics
The fabrication of future sub-5-nanometer electronics requires etching
with atomic level accuracy, which is beyond the reach of conventional
plasma etching technology. In this project, novel plasma-based processes
will be developed for layer-by-layer removal of material using atomic
layer etching (ALEt). Adrie Mackus,
leader of this project and Assistant Professor at the Plasma and
Materials Processing group of Applied Physics, will collaborate with a
diverse group of users from industry and academia, strengthening the
leading position of the Netherlands in semiconductor equipment
manufacturing.
Source: LINK
Nanolab@TU/e, a laboratory for nanotechnology research and innovation. Picture: Bart Van Overbeeke.
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