High Speed Batch Atomic Layer Deposition using Vortex ALD by Lotus Applied Technology

Here is a cool animation on the Lotus High Speed Batch Atomic Layer Deposition using Vortex ALD.

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Founded in 2007, Lotus Applied Technology was formed through a spinoff of the thin film process group within Planar Systems, Inc., a pioneer in Atomic Layer Deposition technology and manufacturing. Housed in a fully dedicated 20,000 square foot thin film processing and R&D facility in Hillsboro, Oregon, the team of technologists has been working together for over 20 years, developing innovative solutions to thin film processing challenges. Their equipment set includes a wide array of thin film deposition, lithography, and patterning equipment, including a versatile set of ALD equipment:

• Six P400 Conventional Pulse-Based Batch ALD reactors
• Roll to Roll ALD Research Scale Reactor
• TransFlex Roll to Roll ALD Pilot Scale Reactor
• Vortex Rotary Batch Reactor