MRS Bulletin reports: Sheets of molybdenum disulfide (MoS2) just a few atoms thick hold promise for high-performance, flexible electronics as well as optical applications. But one obstacle the two-dimensional (2D) material faces is the lack of an efficient method to make it in large quantities. Researchers at Argonne National Laboratory have now demonstrated that the atomic layer deposition method could be used to make uniform, crystalline MoS2 thin films as large as a standard 300 mm silicon wafer.
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ALD Process: molybdenum hexafluoride (MoF6) and hydrogen sulfide at 200 °C
The atomic layer deposition method could be used to make large crystalline 2D MoS2 thin films. https://t.co/6dLel1kYwM #materialsscience— MRS Bulletin (@MRSBulletin) March 24, 2018