Tuesday, January 10, 2017

Abstract Deadline Feb 17 for ALD & ALE 2017 in Denver Colorado

17th International Conference on Atomic Layer Deposition
-Featuring the 4th International Atomic Layer Etching Workshop (ALE2017)- 
 
 
DATE & LOCATION:
July 15-18, 2017 Sheraton Denver, Denver, Colorado 
 
ALD 2017 will be a three-day meeting (preceded by a one day tutorial), dedicated to the science and technology of atomic layer controlled deposition of thin films. Once again the meeting will feature the Atomic Layer Etching Workshop. As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations will available online.

ABSTRACT DEADLINE:
February 17, 2017

WEBSITE:
Details will be posted to the ALD 2017 Website in November 2016. Bookmark: www.ald-avs.org