Wednesday, December 14, 2016

High-Throughput, Cost-Effective Deposition via Atmospheric Pressure Spatial Atomic Layer Deposition

Here is a new paper on atmospheric Spatial ALD from Kevin Musselman and co-workers at University of Waterloo in Canada. According to information at The Waterloo Institute for Nanotechnology web: "Musselman helped pioneer the use of atmospheric pressure spatial atomic layer deposition (AP-SALD) thin films in optoelectronic devices. He used these films to address key questions in the field of energy conversion and to develop new optoelectronic devices. Musselman produced thin films of metal oxide alloys with tunable optoelectronic properties with which he probed loss mechanisms in colloidal quantum dot solar cells, ‘hybrid’ polymer-oxide solar cells and light emitting diodes, and all-oxide solar cells. These metal oxide films were also used to produce new, colour-pure “hybrid” organometal halide perovskite light-emitting diodes."

Nanomanufacturing: High-Throughput, Cost-Effective Deposition of Atomic Scale Thin Films via Atmospheric Pressure Spatial Atomic Layer Deposition

Kevin P. Musselman, Chukwuka F. Uzoma, and Michael S. Miller
Chemistry of Materials 2016 28 (23), 8443-8452
DOI: 10.1021/acs.chemmater.6b03077