Monday, August 10, 2015

Ferroelectric HfO2 by ALD Key Breakthrough in ITRS “Beyond CMOS” Update 2015

Following the ITRS Summer Meeting, Palo Alto, CA, July 11-12, 2015 Ferroelectric HfO2 by Fraunofer CNT and NaMLab in Dresden Germany is showcased as a "Key Breakthrough" in the ITRS “Beyond CMOS” Update 2015. You can find this presentation in by ITRS Emerging Research Devices (ERD) amongst others in the excellent new ITRS 2.0 website :

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