Wednesday, August 2, 2017
Tuesday, August 1, 2017
ALD helps searching for traces of drugs and bomb-making components
BUFFALO, N.Y. — Scientists searching for traces of drugs, bomb-making components and other chemicals often shine light on the materials they’re analyzing.
This approach is known as spectroscopy, and it involves studying how light interacts with trace amounts of matter.
This approach is known as spectroscopy, and it involves studying how light interacts with trace amounts of matter.
The image above depicts a new device for surface enhanced infrared absorption spectroscopy. Infrared light (the white beams) is trapped by tiny gaps in the metal surface, where it can be used to detect trace amounts of matter. Credit: University at Buffalo.
One of the more effective types of spectroscopy is infrared absorption spectroscopy, which scientists use to sleuth out performance-enhancing drugs in blood samples and tiny particles of explosives in the air.
Wednesday, July 26, 2017
A cool Fab movie form Intels D1X Fab
For those of you who have the hots for 3D printing, additive manufacturing and Industry 4.0 check out the real stuff happening every day 24/7. Here is a cool Fab movie form Intels D1X Fab that is a new extension of their D1D factory at the
Ronler Acres campus in Hillsboro, Oregon. D1D/D1X is where the company
designs and manufactures all the latest technology nodes : 14nm, 10nm and 7nm technology.
Screendump (youtube.com)
At 00:18 in the movie below you can spot an ASM A412 Large Batch Furnace on the left with its characteristic pale yellow and white panels and the black tinted doors and windows. Summer competition - What other tools can you spot? Any ALD machines?
ASM report strong order intake in ALD for 3D-NAND and Foundry in its 2Q 2017 report
For 2017, the leading ALD equipment manufacturer ASM International expect a clear improvement in the single wafer ALD market and they forecast the single wafer ALD market to reach a size of about USD 1.5 billion by 2020-2021. As a comparasion the ALD market as a whole was estimated to USD 1.4 to 1.5 billion in 2016 (Gartner, VLSI Research, TECHCET), including all segments (e.g. Semi, MEMS, PV, OLED and R&D).
ASM International N.V. (Euronext Amsterdam: ASM) today reports its second quarter 2017 operating results (unaudited) in accordance with IFRS. (LINK)
Investor presentation Q2 2017
- New orders at €206 million were 1% above the Q1 2017 level and 29% above last year's Q2 level.
- Net sales for the second quarter 2017 were €202 million, an increase of 40% compared to the previous quarter. Year-on-year net sales increased with 46%.
- Net earnings of €132 million in the second quarter included a result of €84 million from the 5% sale and dilution of the ASMPT stake.
- Normalized net earnings for the second quarter 2017 increased by €14 million compared to the first quarter 2017. Operating result increased to €38 million. The financing result included €11 million negative effects from currencies compared to €7 million negative effects in the first quarter. The result from investments decreased with €4 million due to the dilution of our stake in ASMPT. Moreover the ASMPT results in the first quarter included a one-off non-cash gain of €10 million related to the revaluation of the convertible bond.
Commenting
on the results, Chuck del Prado, President and Chief Executive Officer
of ASM International said:
"In Q2 we realized sales of €202 million,
which was slightly above our guidance and at a historical high quarterly
level. The order intake for Q2, at €206 million, came in at the high
end of the forecast and was also at the highest level in the company's
history. Order intake in ALD was primarily strong from the 3D-NAND and
Foundry segments. We also received several Intrepid Epitaxy orders in
Q2."
OUTLOOK
Based
on our current assessment, we continue to expect a clear year-on-year
improvement in the single wafer ALD market in 2017, with demand in the
Logic/Foundry segment remaining healthy and a strong increase in the
3D-NAND segment.
For
Q3 we expect a sales level of €170-190 million, on a currency
comparable level, while for the second half of 2017 as a whole we expect
a sales level higher than in the first half of 2017. After the very
strong orders in the past two quarters we expect order intake in Q3 at a
still healthy level of €150-170 million, on a currency comparable
level.
Saturday, July 22, 2017
Veeco CNT ships its 500th ALD system
As reported by Solid State Technology: Veeco Instruments (Veeco) recently announced that Veeco CNT—formerly known as Ultratech/Cambridge Nanotech—shipped its 500th Atomic Layer Deposition (ALD) system to the North Carolina State University. The Veeco CNT Fiji G2 ALD system will enable the University to perform research for next-generation electronic devices including wearables and sensors. Veeco announced the overall acquisition of Ultratech on May 26 of this year. Executive technologists from Veeco discussed the evolution of ALD technology with Solid State Technology in an exclusive interview just prior to SEMICON West 2017.
Friday, July 21, 2017
Join the Critical Materials Council (CMC) Conference 2018, April 26-27 in Phoenix
Join the Critical Materials Council (CMC) Conference 2018, April 26-27 in Phoenix, Arizona. Get actionable information on materials and supply-chains for current and future semiconductor manufacturing.
Hotel location TBD
More details will be available soon on cmcfabs.org
For information on sponsorship please contact cmcinfo@techcet.com
Monday, July 17, 2017
Introducing the FlexAL-2D the ALD Plasma Processing System for 2D Materials
Oxford
Instruments’ ALD and 2D technical specialists have teamed up with
Eindhoven University of Technology research teams to develop the
innovative FlexAL-2D for atomic layer deposition (ALD) of 2D transition
metal dichalcogenides for nanodevice applications.
Source: AZoNano LINK
More information can also be found at http://www.oxinst.com/FlexAL2D
Source: AZoNano LINK
More information can also be found at http://www.oxinst.com/FlexAL2D
Saturday, July 15, 2017
RASIRC Releases Next Generation RainMaker Humidification System for Fine Water Vapor Delivery
RHS Solves ALD delivery problems by eliminating particles and microdroplets at very high or very low flow rates
San Diego, Calif – July 15, 2017–RASIRC today announced the release of the next generation RainMaker® Humidification System (RHS). The system incorporates a new control system that provides highly accurate, droplet free water vapor for advanced atomic layer deposition (ALD) processes. The RHS has a wide mass delivery range of 50 - 5100 mg/min water mass flow rate in carrier gases. The system is capable of highly accurate and precise delivery of gaseous water into pressures from atmosphere to high vacuum.
“As demands for film quality and uniformity in ALD/ALE processes become increasingly challenging, process engineers have reached the limits with bubbler delivery methods,” said Jeffrey Spiegelman, President and Founder of RASIRC. “The RHS solves problems associated with process control and microdroplet formation, leading to better film uniformity and fewer defects.”
The next generation RainMaker® Humidification System (RHS)
Thursday, July 13, 2017
On the road to Denver for ALD2017?
Twitter is heating up with announcements of people and companies going to the ALD2017 conference in Denver 15 to 18 of July. Here is a selection of some of them. Please take a chance to download the conference app (see tweet below)
It is on, #ALDALE2017 pic.twitter.com/WnTjQFE4Hu— Scientist Tiger (@sean_t_barry) July 14, 2017
#ALDALE2017 the mobile app user name= ALD the password= Denver— AVS (@AVS_Members) July 12, 2017
Preperations for #ALDALE2017 :) pic.twitter.com/P6ibXx8yYY— Max Gebhard (@max_gebhard) July 13, 2017
Katja can't wait to present her study on #ALDep of copper at #ALDALE2017 @iivosen_tomi is eager too! pic.twitter.com/SA8KzjRq6B— HelsinkiALD (@HelsinkiALD) July 14, 2017
Just a few days to go @AvsAld conference (15-18 July). Visit us at booth #33 and speak to our #ALDep experts #ALDALE2017 pic.twitter.com/OeGsQ2h7rH— Oxford Instruments (@OxInst) July 13, 2017
Counting down to ALD2017! Come learn about our CVD/ALD #precursors & more at booth 34! #ALDALE2017 #CVDep #ALDep https://t.co/NBygrem21B pic.twitter.com/JxgkoTEbTu— Strem Chemicals Inc. (@StremChemicals) July 12, 2017
The George group will have a strong presence at #ALDALE2017 with 11 presentations. Find out more: https://t.co/JwKJ6YcAxV #ALDep #ALEtch— George Laboratory (@GeorgeGroupCU) July 11, 2017
Beneq is a proud platinum sponsor of #ALDALE2017. Visit our event website to get all the details. https://t.co/GrwxFnlz4b #beneqblog #ALDep pic.twitter.com/uGshtkGXof— Beneq Corporation (@beneqcorp) July 12, 2017
— kyle kimmerle (@pdxguy2009) July 15, 2017
Epivalence is Open for business #ALDALE2017 pic.twitter.com/A380ZOdII4— Simon Rushworth (@SARushworth) July 15, 2017
We're proud to be a platinum sponsor of #ALDALE2017, which is all about #AtomicScale processing. More info: https://t.co/jmmSC1c7Ud pic.twitter.com/izMQFfPIdo— LamResearch (@LamResearch) July 14, 2017
Film Sense and Kurt J. Lesker: in-situ Ellipsometry with the FS-1
The Film Sense vision “to create easy-to-use and affordable ellipsometers” is especially relevant for in-situ applications. The Film Sense FS-1 realizes this vision by providing the power of Multi-Wavelength Ellipsometry, at an affordable price and compact size that is ideal for in-situ measurements. The FS-1 can provide real time thickness data with exceptional precision, which can be indispensable for the efficient development of new ALD processes. In the plot below, the “steps” in the data are direct observations of the thickness changes on the sample throughout the ALD cycles: the thickness increases and saturates as the precursor is introduced (trimethyl aluminum in this case), and then decreases as the film is oxidized (thermally by H2O in this case).
The relationship between Film Sense and
Kurt J. Lesker dates back to almost the inception of Film Sense. In fact, the first Film Sense FS-1 in-situ testing
was performed on a Kurt J. Lesker ALD150LX reactor in 2014. The FS-1 has since been integrated on multiple
Lesker ALD reactors, and has been used to characterize a wide variety of thin
films including: Al2O3, TiO2, HfO2, and
TiN.
The
ALD150LX was designed from the ground up for advanced R&D and features
remote plasma as well as in-situ ellipsometry
as a primary means of real time process monitoring and control during ALD. Patented Precursor Focusing TechnologyTM
(PFTTM) prevents unwanted film deposition on sensitive surfaces
inside the reactor including the analytical port windows used for light transmission
during in-situ ellipsometry. The layout
of the plasma-enhanced ALD (PEALD) reactor makes installation and operation of
the compact FS-1 unit simple and easy.
According
to Bruce Rayner, Principal Scientist – ALD at the Kurt J. Lesker Company, “The
FS-1 provides excellent performance at a very attractive price, and its robust,
compact design is ideally suited for in-situ
ALD applications.”
If you are coming to ALD2017 in Denver,
please visit the Lesker booth #31 to see a live demonstration of the FS-1
integrated on an ALD150LX reactor. At
the Film Sense booth #1, an FS-XY150 automated mapping stage will be on
display.
The Film Sense FS-1 ellipsometer is now available
as an option for the Lesker ALD150LX reactor.
For more information please contact Dan Hadwiger (mailto:dhadwiger@film-sense.com) or
Noel O’Toole (mailto: noelo@lesker.com), or visit our websites at http://www.film-sense.com/products/fs-1-ald-applications/fs-1-lesker-ald150lx
and https://www.lesker.com/newweb/vacuum_systems/deposition_systems_ald_ald150lx.cfm.
Subscribe to:
Posts (Atom)