High-index-contrast gratings for III-nitride vertical-cavity surface-emitting laser diodes

Semiconductor Today reports that researchers based in Taiwan and Sweden claim the first demonstration of high-index-contrast grating (HCG) as the top mirror for III-nitride (III-N) vertical-cavity surface-emitting laser (VCSEL) diodes [Tsu-Chi Chang et al, ACS Photonics, published online 26 February 2020]. The team from National Chiao Tung University and Chalmers University of Technology hope that the development will lead to “substantial thickness reduction, polarization-pinning, and setting of the resonance wavelength by the grating parameters”.

Please follow the link below to find out where ALD was used ;-)

Article: High-index-contrast gratings for III-nitride vertical-cavity surface-emitting laser diodes (LINK)

Picture from graphical abstract, ACS Photonics 2020, 7, 4, 861-866 Publication Date:February 26, 2020

https://doi.org/10.1021/acsphotonics.9b01636

Veeco Introduces Suite of MOCVD Systems to Enable High Performance Photonics Devices

Plainview, N.Y. - Veeco Instruments Inc. (Nasdaq: VECO) introduced today the Lumina Metal Organic Chemical Vapor Deposition (MOCVD) platform, which incorporates the proprietary TurboDisc® reactor technology for outstanding film uniformity, yield and device performance for a variety of photonics applications. This new MOCVD platform, including the Lumina R480™ and Lumina R480S™ models, will accelerate the production of VCSEL, Edge-Emitting Laser (EEL) and Mini / Micro LED devices. 

 

(Image: Veeco)

In response to strong consumer demand for arsenic phosphide (As/P) MOCVD technology, the Lumina platform is advancing a new generation of high-efficiency photonics devices including VCSELs used in 3D sensing, autonomous driving and high-speed data communication. The Lumina platform is also designed for mini and micro LED production for advanced displays found in next-generation 4K and 8K televisions, smartphones and wearable devices, as well as EEL devices used for advanced optical communications and silicon photonics applications.

“Leading photonics manufacturers are currently seeing the benefits of our Lumina MOCVD system and are validating its impact in the manufacturing of high-volume photonics devices,” said Gerry Blumenstock, Senior Vice President, Product Line Management. “As the world’s leader in MOCVD equipment, the Lumina platform is the answer for the next generation VCSEL, EEL andmini / micro LED devices. With its proven design, technology and performance, Lumina provides exciting opportunities for the next generation of photonics devices.”

The Lumina R480 and R480S systems are based on Veeco’s industry leading MOCVD TurboDisc® technology which features excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, Veeco’s proprietary technology drives uniform thermal control for excellent thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high quality As/P epitaxial layers on wafers up to six inches in diameter. The R480 and R480S systems allow users to customize their systems for maximum value.

Veeco will be exhibiting at Photonics West in San Francisco, CA from Tuesday, February 4 to Thursday, February 6. Stop by booth number 1456 to learn more about Veeco’s MOCVD and ion beam sputtering solutions for photonics applications.