Plainview, N.Y. - Veeco Instruments Inc. (Nasdaq: VECO) introduced today the Lumina Metal Organic Chemical Vapor Deposition (MOCVD) platform, which incorporates the proprietary TurboDisc® reactor technology for outstanding film uniformity, yield and device performance for a variety of photonics applications. This new MOCVD platform, including the Lumina R480™ and Lumina R480S™ models, will accelerate the production of VCSEL, Edge-Emitting Laser (EEL) and Mini / Micro LED devices.
(Image: Veeco)
“Leading photonics manufacturers are currently seeing the benefits of our Lumina MOCVD system and are validating its impact in the manufacturing of high-volume photonics devices,” said Gerry Blumenstock, Senior Vice President, Product Line Management. “As the world’s leader in MOCVD equipment, the Lumina platform is the answer for the next generation VCSEL, EEL andmini / micro LED devices. With its proven design, technology and performance, Lumina provides exciting opportunities for the next generation of photonics devices.”
The Lumina R480 and R480S systems are based on Veeco’s industry leading MOCVD TurboDisc® technology which features excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, Veeco’s proprietary technology drives uniform thermal control for excellent thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high quality As/P epitaxial layers on wafers up to six inches in diameter. The R480 and R480S systems allow users to customize their systems for maximum value.
Veeco will be exhibiting at Photonics West in San Francisco, CA from Tuesday, February 4 to Thursday, February 6. Stop by booth number 1456 to learn more about Veeco’s MOCVD and ion beam sputtering solutions for photonics applications.
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