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Join this webinar featuring ALD (atomic layer deposition) pioneer Beneq to learn about the unique benefits of ALD for critical chamber components with complex geometry, and how the technology offers the ultimate anti-corrosion coating solution for semiconductor equipment parts.
If you can't attend the live session, register for access to a recording for later viewing.
Semiconductor manufacturing involves corrosive gases in multiple processes. As we transition to each new technology node, e.g. from 10nm to 7nm and to 5nm, there are even more stringent fab requirements against metal and particle contamination. This poses challenges for existing coating methods such as anodization or plasma spray, which may not provide complete protection especially on critical chamber components with complex geometry.
Topics to be discussed:
- Common issues of metal or particle contamination for critical chamber components
- Common coating methods to protect against corrosion, and how they compare
- What properties to look for – e.g. high purity and uniformity – when evaluating the optimal protective coating solution
- Unique benefits of ALD coatings with Al2O3 and Y2O3
- How to work with your OEM partner to design, test and implement an ALD coating solution for your equipment
Agenda and Speaker Information
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